Nucleation effects in visible-laser chemical vapor deposition

1987 ◽  
Vol 5 (2) ◽  
pp. 496 ◽  
Author(s):  
Modest M. Oprysko
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Visible Laser

Direct Writing Using Laser Chemical Vapor Deposition

1982 ◽  
Vol 17 ◽  
Author(s):  
S. D. Allen ◽  
A. B. Trigubo ◽  
R. Y. Jan
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Semiconductor Films ◽  
Direct Writing ◽  
Laser Chemical Vapor Deposition ◽  
Si Substrates ◽  
Visible Laser ◽  
Laser Sources ◽  
Transmission And Reflection

ABSTRACTMetal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition (LCVD) using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the filmpsubstrate during deposition. Single crystallites of W greater than 100 pm tall were deposited using a Kr laser on Si substrates.

High‐speed laser chemical vapor deposition of copper: A search for optimum conditions

1989 ◽  
Vol 65 (6) ◽  
pp. 2470-2474 ◽  
Author(s):  
B. Markwalder ◽  
M. Widmer ◽  
D. Braichotte ◽  
H. van den Bergh
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Chemical Vapor ◽  
Optimum Conditions ◽  
Laser Chemical Vapor Deposition

Fractal growth of sp3-bonded 5H-BN microcones by plasma-assisted laser chemical vapor deposition

2006 ◽  
Vol 99 (12) ◽  
pp. 123512 ◽  
Author(s):  
Shojiro Komatsu ◽  
Daisuke Kazami ◽  
Hironori Tanaka ◽  
Yusuke Moriyoshi ◽  
Masaharu Shiratani ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Fractal Growth
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