Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition

P. Colpo; G. Ceccone; P. Sauvageot; M. Baker; F. Rossi

doi:10.1116/1.582306

Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582306 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1096-1101 ◽

Cited By ~ 13

Author(s):

P. Colpo ◽

G. Ceccone ◽

P. Sauvageot ◽

M. Baker ◽

F. Rossi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

The Journal of Physical Chemistry B ◽

10.1021/jp045412z ◽

2005 ◽

Vol 109 (11) ◽

pp. 4917-4922 ◽

Cited By ~ 38

Author(s):

Osamu Tsuda ◽

Masatou Ishihara ◽

Yoshinori Koga ◽

Shuzo Fujiwara ◽

Yuichi Setsuhara ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Amorphous Hydrogenated Carbon

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Synthesis and characterization of nitrogen-doped 3D graphene foam prepared by inductively-coupled plasma-assisted chemical vapor deposition

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) ◽

10.1109/nano.2015.7388764 ◽

2015 ◽

Author(s):

A. Wisitsoraat ◽

D. Phokaratkul ◽

T. Maturos ◽

K. Jaruwongrangsee ◽

A. Tuantranont

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Synthesis And Characterization ◽

Graphene Foam ◽

3D Graphene ◽

Nitrogen Doped ◽

Inductively Coupled

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Characterization of SiC thin films grown on Si by inductively coupled plasma chemical vapor deposition at low temperatures

2000 International Semiconducting and Insulating Materials Conference. SIMC-XI (Cat. No.00CH37046) ◽

10.1109/sim.2000.939245 ◽

2002 ◽

Author(s):

Tai-Fa Young ◽

Chin-Lien Hsiao ◽

Chia-Lin Peng

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Synthesis and characterization of superhard Ti–Si–N films obtained in an inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) with magnetic confinement

Applied Surface Science ◽

10.1016/j.apsusc.2005.05.020 ◽

2006 ◽

Vol 252 (8) ◽

pp. 3065-3072 ◽

Cited By ~ 18

Author(s):

Hong-yu Zhao ◽

Qiu-lin Fan ◽

Li-xin Song ◽

Tao Zhang ◽

Er-wei Shi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Magnetic Confinement ◽

Synthesis And Characterization ◽

Inductively Coupled

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Upcycling Waste Lard Oil into Vertical Graphene Sheets by Inductively Coupled Plasma Assisted Chemical Vapor Deposition

Nanomaterials ◽

10.3390/nano7100318 ◽

2017 ◽

Vol 7 (10) ◽

pp. 318 ◽

Cited By ~ 8

Author(s):

Angjian Wu ◽

Xiaodong Li ◽

Jian Yang ◽

Changming Du ◽

Wangjun Shen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Graphene Sheets ◽

Inductively Coupled

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Synthesis of vertical graphene nanowalls by cracking n-dodecane using RF inductively-coupled plasma-enhanced chemical vapor deposition

Plasma Science and Technology ◽

10.1088/2058-6272/ab5194 ◽

2019 ◽

Vol 22 (2) ◽

pp. 025504

Author(s):

Jiageng ZHENG ◽

Qinhuai TAN ◽

Hang CHEN ◽

Angjian WU ◽

Xiaodong LI ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838318 ◽

1998 ◽

Vol 145 (2) ◽

pp. 652-658 ◽

Cited By ~ 37

Author(s):

Sang‐Soo Han ◽

Byung‐Hyuk Jun ◽

Kwangsoo No ◽

Byeong‐Soo Bae

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Hydrogen Content ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Effects of growth variables on the properties of single crystalline ZnO thin film grown by inductively coupled plasma metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.01.008 ◽

2009 ◽

Vol 517 (15) ◽

pp. 4432-4435 ◽

Cited By ~ 9

Author(s):

Ju-Hoon Park ◽

Chang-Bae Lee ◽

Il-Soo Kim ◽

Seong-Joo Jang ◽

Byung-Teak Lee

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Thin Film ◽

Inductively Coupled ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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