Synthesis and characterization of superhard Ti–Si–N films obtained in an inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) with magnetic confinement

Hong-yu Zhao; Qiu-lin Fan; Li-xin Song; Tao Zhang; Er-wei Shi; Xing-fang Hu

doi:10.1016/j.apsusc.2005.05.020

Synthesis and characterization of superhard Ti–Si–N films obtained in an inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) with magnetic confinement

Applied Surface Science ◽

10.1016/j.apsusc.2005.05.020 ◽

2006 ◽

Vol 252 (8) ◽

pp. 3065-3072 ◽

Cited By ~ 18

Author(s):

Hong-yu Zhao ◽

Qiu-lin Fan ◽

Li-xin Song ◽

Tao Zhang ◽

Er-wei Shi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Magnetic Confinement ◽

Synthesis And Characterization ◽

Inductively Coupled

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Synthesis and characterization of nitrogen-doped 3D graphene foam prepared by inductively-coupled plasma-assisted chemical vapor deposition

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) ◽

10.1109/nano.2015.7388764 ◽

2015 ◽

Author(s):

A. Wisitsoraat ◽

D. Phokaratkul ◽

T. Maturos ◽

K. Jaruwongrangsee ◽

A. Tuantranont

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Synthesis And Characterization ◽

Graphene Foam ◽

3D Graphene ◽

Nitrogen Doped ◽

Inductively Coupled

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Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582306 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1096-1101 ◽

Cited By ~ 13

Author(s):

P. Colpo ◽

G. Ceccone ◽

P. Sauvageot ◽

M. Baker ◽

F. Rossi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

The Journal of Physical Chemistry B ◽

10.1021/jp045412z ◽

2005 ◽

Vol 109 (11) ◽

pp. 4917-4922 ◽

Cited By ~ 38

Author(s):

Osamu Tsuda ◽

Masatou Ishihara ◽

Yoshinori Koga ◽

Shuzo Fujiwara ◽

Yuichi Setsuhara ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Amorphous Hydrogenated Carbon

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Characterization of SiC thin films grown on Si by inductively coupled plasma chemical vapor deposition at low temperatures

2000 International Semiconducting and Insulating Materials Conference. SIMC-XI (Cat. No.00CH37046) ◽

10.1109/sim.2000.939245 ◽

2002 ◽

Author(s):

Tai-Fa Young ◽

Chin-Lien Hsiao ◽

Chia-Lin Peng

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Chemical Vapor Deposition Synthesis and Characterization of Hollow Carbon Nanospheres with High Specific Capacitance and Excellent Cycling Stability

Journal of Electronic Materials ◽

10.1007/s11664-021-08818-7 ◽

2021 ◽

Author(s):

Mehrdad Teymourzadeh ◽

Majid Seifi ◽

Mohammad Bagher Askari

Keyword(s):

Chemical Vapor Deposition ◽

Specific Capacitance ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Specific Capacitance ◽

Synthesis And Characterization ◽

Carbon Nanospheres ◽

Excellent Cycling Stability ◽

Hollow Carbon

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Synthesis and characterization of GaN nanowires by a catalyst assisted chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2011.06.110 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9931-9934 ◽

Cited By ~ 20

Author(s):

Xiaofeng Wei ◽

Feng Shi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Synthesis And Characterization ◽

Gan Nanowires

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Upcycling Waste Lard Oil into Vertical Graphene Sheets by Inductively Coupled Plasma Assisted Chemical Vapor Deposition

Nanomaterials ◽

10.3390/nano7100318 ◽

2017 ◽

Vol 7 (10) ◽

pp. 318 ◽

Cited By ~ 8

Author(s):

Angjian Wu ◽

Xiaodong Li ◽

Jian Yang ◽

Changming Du ◽

Wangjun Shen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Graphene Sheets ◽

Inductively Coupled

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Synthesis and characterization of nanostructured molybdenum oxynitride films fabricated by sub-atmospheric chemical vapor deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2019.07.182 ◽

2019 ◽

Vol 808 ◽

pp. 151470

Author(s):

Vladislav Dřínek ◽

Mariana Klementová ◽

Lukáš Palatinus ◽

Pavel Dytrych ◽

Radek Fajgar ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Synthesis And Characterization

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