Application of direct bias control in high-density inductively coupled plasma etching equipment

2000 ◽  
Vol 18 (2) ◽  
pp. 405-410 ◽  
Author(s):  
Roger Patrick ◽  
Scott Baldwin ◽  
Norman Williams
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
High Density ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN

2005 ◽  
Vol 23 (4) ◽  
pp. 1611 ◽  
Author(s):  
David S. Y. Hsu ◽  
Chul Soo Kim ◽  
Charles R. Eddy ◽  
Ronald T. Holm ◽  
Richard L. Henry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
High Density ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

High Density Inductively Coupled Plasma Etching of Zinc-Oxide(ZnO) and Indium-Zinc Oxide(IZO)

2019 ◽  
Vol 6 (2) ◽  
pp. 239-247
Author(s):  
Wantae Lim ◽  
Luc Stafford ◽  
Brent Gila ◽  
David Norton ◽  
Steve Pearton ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
High Density ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Indium Zinc Oxide

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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