Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution

1998 ◽  
Vol 16 (5) ◽  
pp. 3134-3137 ◽  
Author(s):  
Mitsuru Imaizumi ◽  
Kazuhiko Okitsu ◽  
Masafumi Yamaguchi ◽  
Tamio Hara ◽  
Tadashi Ito ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Microcrystalline Silicon ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogen Dilution ◽  
Microcrystalline Silicon Film

Growth Rate and Crystallinity of Nanocrystalline Silicon Film Grown by Electron Beam Excited Plasma Chemical Vapor Deposition

2000 ◽  
Vol 39 (Part 1, No. 10) ◽  
pp. 6035-6036 ◽  
Author(s):  
Tadashi Ito ◽  
Mitsuru Imaizumi ◽  
Koji Yamaguchi ◽  
Kazuhiko Okitsu ◽  
Ichiro Konomi ◽  
...  
Keyword(s):  
Growth Rate ◽  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition
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