Gate leakage current: A sensitive characterization parameter for plasma-induced damage detection in ultrathin oxide submicron transistors
1998 ◽
Vol 16
(3)
◽
pp. 1664-1669
◽
Keyword(s):
2003 ◽
Vol 47
(11)
◽
pp. 1973-1981
◽
2003 ◽
Vol 50
(12)
◽
pp. 2499-2506
◽
2008 ◽
Vol 128
(6)
◽
pp. 885-889
Keyword(s):
2010 ◽
Vol 93
(6)
◽
pp. 19-24
◽
2004 ◽
Vol 43
(No. 12B)
◽
pp. L1598-L1600
◽