Gate leakage current: A sensitive characterization parameter for plasma-induced damage detection in ultrathin oxide submicron transistors

1998 ◽  
Vol 16 (3) ◽  
pp. 1664-1669 ◽  
Author(s):  
J. Jiang ◽  
O. O. Awadelkarim ◽  
J. Werking
2003 ◽  
Vol 50 (12) ◽  
pp. 2499-2506 ◽  
Author(s):  
Jonghwan Lee ◽  
G. Bosman ◽  
K.R. Green ◽  
D. Ladwig

2018 ◽  
Vol 328 ◽  
pp. 30-34 ◽  
Author(s):  
Qi Wang ◽  
Yaomi Itoh ◽  
Tohru Tsuruoka ◽  
Masakazu Aono ◽  
Deyan He ◽  
...  

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