Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe
1998 ◽
Vol 16
(1)
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pp. 100-107
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2012 ◽
Vol 30
(6)
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pp. 06FF06
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2011 ◽
Vol 4
(1)
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pp. 34-39
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2005 ◽
Vol 34
(6)
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pp. 740-745
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2015 ◽
Vol 32
(5)
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pp. 058102
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