Fabrication of high-aspect-ratio double-slot photonic crystal waveguide in InP heterostructure by inductively coupled plasma etching using ultra-low pressure
2012 ◽
Vol 30
(6)
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pp. 06FF02
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2011 ◽
Vol 29
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pp. 020601
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2011 ◽
Vol 29
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pp. 021006
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2008 ◽
Vol 26
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pp. 1896-1902
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2012 ◽
Vol 30
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pp. 06FF06
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2008 ◽
Vol 26
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pp. 1675
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2011 ◽
Vol 4
(1)
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pp. 34-39
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