Atomic layer epitaxy growth of aluminum oxide thin films from a novel Al(CH3)2Cl precursor and H2O

1997 ◽  
Vol 15 (4) ◽  
pp. 2214-2218 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Janne Jokinen
Keyword(s):  
Thin Films ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy ◽  
Oxide Thin Films

Growth of gallium oxide thin films from gallium acetylacetonate by atomic layer epitaxy

1996 ◽  
Vol 6 (1) ◽  
pp. 27-31 ◽  
Author(s):  
Minna Nieminen ◽  
Lauri Niinistö ◽  
Eero Rauhala
Keyword(s):  
Thin Films ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy ◽  
Oxide Thin Films

scholarly journals Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

2019 ◽  
Vol 37 (4) ◽  
pp. 040901 ◽  
Author(s):  
Fatemeh S. M. Hashemi ◽  
LiAo Cao ◽  
Felix Mattelaer ◽  
Timo Sajavaara ◽  
J. Ruud van Ommen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Nucleation Effects in the Atomic Layer Deposition of Nickel–Aluminum Oxide Thin Films

2020 ◽  
Vol 32 (5) ◽  
pp. 1925-1936 ◽  
Author(s):  
Jon G. Baker ◽  
Joel R. Schneider ◽  
James A. Raiford ◽  
Camila de Paula ◽  
Stacey F. Bent
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Nickel Aluminum ◽  
Oxide Thin Films ◽  
Layer Deposition

Growth of Indium‐Tin‐Oxide Thin Films by Atomic Layer Epitaxy

1995 ◽  
Vol 142 (10) ◽  
pp. 3538-3541 ◽  
Author(s):  
Timo Asikainen ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy ◽  
Oxide Thin Films
Sign in / Sign up

Export Citation Format

Share Document