Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition

Kenji Hiramatsu; Hiroshi Ohnishi; Toru Takahama; Ken‐ichiro Yamanishi

doi:10.1116/1.580129

Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580129 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1037-1040 ◽

Cited By ~ 14

Author(s):

Kenji Hiramatsu ◽

Hiroshi Ohnishi ◽

Toru Takahama ◽

Ken‐ichiro Yamanishi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Tin Films ◽

Plasma Chemical Vapor Deposition

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Formation of Iron Carbide Nanorod by Pulsed Plasma Chemical Vapor Deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/258/1/012012 ◽

2010 ◽

Vol 258 ◽

pp. 012012

Author(s):

S Yooyen ◽

T Kawamura ◽

S Kotake ◽

Y Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Iron Carbide ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Discharge Instability at Patterned Conductive Layers on Insulating Substrates during Pulsed-Plasma Chemical Vapor Deposition under Near Atmospheric Pressures

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2013.47 ◽

2013 ◽

Vol 11 (0) ◽

pp. 47-52

Author(s):

Yohei Inayoshi ◽

Hirokazu Fukidome ◽

Setsuo Nakajima ◽

Tsuyoshi Uehara ◽

Yasutake Toyoshima ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Insulating Substrates

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Lift-off process with bi-layer photoresist patterns for conformal-coated superhydrophilic pulsed plasma chemical vapor deposition-SiOxon SiCxfor lab-on-a-chip applications

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.047201 ◽

2015 ◽

Vol 54 (4) ◽

pp. 047201 ◽

Cited By ~ 3

Author(s):

Satoshi Konishi ◽

Chise Nakagami ◽

Taizo Kobayashi ◽

Wataru Tonomura ◽

Yoshihiro Kaizuma

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Lab On A Chip ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Lift Off

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Formation of Graphene-Containing Porous Carbon Film for Electric Double-Layer Capacitor by Pulsed Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.045103 ◽

2012 ◽

Vol 51 (4R) ◽

pp. 045103 ◽

Cited By ~ 3

Author(s):

Masahiro Matsushima ◽

Mikio Noda ◽

Golap Kalita ◽

Hideo Uchida ◽

Koichi Wakita ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electric Double Layer ◽

Carbon Film ◽

Chemical Vapor ◽

Electric Double Layer Capacitor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Double Layer Capacitor

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Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with Recycle

Journal of The Electrochemical Society ◽

10.1149/1.2086893 ◽

1990 ◽

Vol 137 (7) ◽

pp. 2103-2116 ◽

Cited By ~ 19

Author(s):

Sang‐Kyu Park ◽

Demetre J. Economou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Formation of Graphene-Containing Porous Carbon Film for Electric Double-Layer Capacitor by Pulsed Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.045103 ◽

2012 ◽

Vol 51 ◽

pp. 045103 ◽

Cited By ~ 3

Author(s):

Masahiro Matsushima ◽

Mikio Noda ◽

Golap Kalita ◽

Hideo Uchida ◽

Koichi Wakita ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electric Double Layer ◽

Carbon Film ◽

Chemical Vapor ◽

Electric Double Layer Capacitor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Double Layer Capacitor

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Preparation of TiN Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.3558 ◽

1991 ◽

Vol 30 (Part 1, No. 12B) ◽

pp. 3558-3561 ◽

Cited By ~ 17

Author(s):

Takashi Akahori ◽

Akira Tanihara ◽

Masashi Tano

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Tin Films ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Tribological and thermal stability study of nanoporous amorphous boron carbide films prepared by pulsed plasma chemical vapor deposition

Science and Technology of Advanced Materials ◽

10.1088/1468-6996/16/3/035007 ◽

2015 ◽

Vol 16 (3) ◽

pp. 035007 ◽

Cited By ~ 12

Author(s):

Shahira Liza ◽

Naoto Ohtake ◽

Hiroki Akasaka ◽

Juan M MunozGuijosa

Keyword(s):

Thermal Stability ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stability Study ◽

Pulsed Plasma ◽

Amorphous Boron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Thermal Stability Study

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Characteristics of nickel tip carbon nanorod growth by pulsed plasma chemical vapor deposition

World Journal of Engineering ◽

10.1260/1708-5284.9.6.469 ◽

2012 ◽

Vol 9 (6) ◽

pp. 469-474

Author(s):

S. Yooyen ◽

T. Kawamura ◽

S. Kotake ◽

Y. Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Nanorod Growth

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Ammonia-free deposition of silicon nitride films using pulsed-plasma chemical vapor deposition under near atmospheric pressure

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3021039 ◽

2009 ◽

Vol 27 (1) ◽

pp. 223 ◽

Cited By ~ 4

Author(s):

M. Matsumoto ◽

Y. Inayoshi ◽

S. Murashige ◽

M. Suemitsu ◽

S. Nakajima ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Nitride Films

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