Electron‐beam controlled radio frequency discharges for plasma processing

1996 ◽  
Vol 14 (4) ◽  
pp. 2094-2101 ◽  
Author(s):  
Mark J. Kushner ◽  
Wenli Z. Collison ◽  
David N. Ruzic
Keyword(s):  
Electron Beam ◽  
Radio Frequency ◽  
Plasma Processing ◽  
Radio Frequency Discharges

scholarly journals Radio frequency plasma processing effects on the emission characteristics of a MeV electron beam cathode

1999 ◽  
Vol 75 (1) ◽  
pp. 31-33 ◽  
Author(s):  
J. I. Rintamaki ◽  
R. M. Gilgenbach ◽  
W. E. Cohen ◽  
R. L. Jaynes ◽  
M. E. Cuneo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radio Frequency ◽  
Plasma Processing ◽  
Emission Characteristics ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Processing Effects

A self-consistent fluid model for radio-frequency discharges in SiH4–H2 compared to experiments

1997 ◽  
Vol 82 (5) ◽  
pp. 2060-2071 ◽  
Author(s):  
G. J. Nienhuis ◽  
W. J. Goedheer ◽  
E. A. G. Hamers ◽  
W. G. J. H. M. van Sark ◽  
J. Bezemer
Keyword(s):  
Radio Frequency ◽  
Fluid Model ◽  
Self Consistent ◽  
Radio Frequency Discharges

Excitation in radio-frequency discharges

1963 ◽  
Vol 19 (8) ◽  
pp. 1309-1317 ◽  
Author(s):  
R. Mavrodineanu ◽  
R.C. Hughes
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Discharges

Design and development of radio frequency system for pulse positron low energy beam and its electron beam trials

2021 ◽  
Vol 16 (09) ◽  
pp. T09002
Author(s):  
S. Shrotriya ◽  
S. Mukherjee ◽  
S.S. Jena ◽  
A. Shiju ◽  
N. Patel ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radio Frequency ◽  
Low Energy ◽  
Design And Development ◽  
Energy Beam

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

Modeling of electronegative radio-frequency discharges

1991 ◽  
Vol 19 (2) ◽  
pp. 122-129 ◽  
Author(s):  
M. Meyyappan ◽  
T.R. Govindan
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Discharges
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