Inversion from selective homoepitaxy of Si to selective Si film deposition on SiO2using an ultraclean electron cyclotron resonance plasma

Takashi Matsuura; Tadahiro Ohmi; Junichi Murota; Shoichi Ono

doi:10.1063/1.108018

Inversion from selective homoepitaxy of Si to selective Si film deposition on SiO2using an ultraclean electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.108018 ◽

1992 ◽

Vol 61 (24) ◽

pp. 2908-2910 ◽

Cited By ~ 3

Author(s):

Takashi Matsuura ◽

Tadahiro Ohmi ◽

Junichi Murota ◽

Shoichi Ono

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma source for conductive film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579309 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1281-1286 ◽

Cited By ~ 31

Author(s):

Toshiro Ono ◽

Hiroshi Nishimura ◽

Masaru Shimada ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Conductive Film ◽

Resonance Plasma

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Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l802 ◽

1993 ◽

Vol 32 (Part 2, No. 6A) ◽

pp. L802-L805 ◽

Cited By ~ 3

Author(s):

Akira Ishii ◽

Yoshiyuki Sakaguchi ◽

Shoichiro Minomo ◽

Michio Taniguchi ◽

Masato Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Diamond Like Carbon Film ◽

Resonance Plasma

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Super‐wide electron cyclotron resonance plasma source excited by traveling microwave as an efficient tool for diamondlike carbon film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579302 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1241-1243

Author(s):

A. Ishii ◽

S. Amadatsu ◽

S. Minomo ◽

M. Taniguchi ◽

M. Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Efficient Tool ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

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Mass Spectrometry Investigation on Decamethylcyclopentasiloxane Electron Cyclotron Resonance Plasma for SiCOH Film Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/25/2/076 ◽

2008 ◽

Vol 25 (2) ◽

pp. 636-639 ◽

Cited By ~ 6

Author(s):

Zhang Hai-Yan ◽

Ye Chao ◽

Ning Zhao-Yuan

Keyword(s):

Mass Spectrometry ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579484 ◽

1995 ◽

Vol 13 (5) ◽

pp. 2427-2434 ◽

Cited By ~ 9

Author(s):

Morito Matsuoka ◽

Shun‐ichi Tohno

Keyword(s):

Oxide Film ◽

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Radio Frequency Sputtering ◽

Resonance Plasma

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CFX(X=1–3)Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4181 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4181-4185 ◽

Cited By ~ 27

Author(s):

Kunimasa Takahashi ◽

Masaru Hori ◽

Shigeru Kishimoto ◽

Toshio Goto

Keyword(s):

Polymer Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Mechanism for CF Polymer Film Deposition through DeepSiO2Holes in Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.2468 ◽

1996 ◽

Vol 35 (Part 1, No. 4B) ◽

pp. 2468-2471 ◽

Cited By ~ 4

Author(s):

Tetsuo Ono ◽

Ryoji Hamasaki ◽

Tatsumi Mizutani

Keyword(s):

Polymer Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Application of electron cyclotron resonance plasma source to conductive film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579833 ◽

1995 ◽

Vol 13 (3) ◽

pp. 815-819 ◽

Cited By ~ 20

Author(s):

Masaru Shimada ◽

Toshiro Ono ◽

Hiroshi Nishimura ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Conductive Film ◽

Resonance Plasma

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Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma

Vacuum ◽

10.1016/s0042-207x(98)00192-4 ◽

1998 ◽

Vol 51 (3) ◽

pp. 445-451 ◽

Cited By ~ 1

Author(s):

SF Yoon ◽

Ruslie ◽

J Ahn ◽

Q Zhang ◽

YS Wu ◽

...

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Film ◽

Electron Cyclotron ◽

Film Deposition ◽

Amorphous Carbon Film ◽

Electron Cyclotron Resonance Plasma ◽

Screen Grid ◽

Resonance Plasma

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Ta-O (Ta-oxide) and Nb-O (Nb-oxide) Film Deposition Using an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l411 ◽

1985 ◽

Vol 24 (Part 2, No. 6) ◽

pp. L411-L413 ◽

Cited By ~ 5

Author(s):

Iwao Watanabe ◽

Hideo Yoshihara

Keyword(s):

Oxide Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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