The influence of ion energy, ion flux, and etch temperature on the electrical and material quality of GaAs etched with an electron cyclotron resonance source

M. W. Cole; K. K. Ko; S. W. Pang

doi:10.1063/1.360067

The influence of ion energy, ion flux, and etch temperature on the electrical and material quality of GaAs etched with an electron cyclotron resonance source

Journal of Applied Physics ◽

10.1063/1.360067 ◽

1995 ◽

Vol 78 (4) ◽

pp. 2712-2715 ◽

Cited By ~ 4

Author(s):

M. W. Cole ◽

K. K. Ko ◽

S. W. Pang

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux ◽

Ion Energy ◽

Material Quality

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Modeling of plasma density, argon ion energy and ion velocity functions in a dipolar electron cyclotron resonance plasma source

Vacuum ◽

10.1016/j.vacuum.2020.109215 ◽

2020 ◽

Vol 174 ◽

pp. 109215

Author(s):

Bin Zhang ◽

Xiaobing Zhang

Keyword(s):

Plasma Density ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Ion Velocity ◽

Argon Ion ◽

Resonance Plasma

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Energy and composition of the ion flux in microwave electron cyclotron resonance/radio frequency methane plasma

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00391-8 ◽

2003 ◽

Vol 174-175 ◽

pp. 914-917 ◽

Cited By ~ 4

Author(s):

Martin Mišina ◽

Petr Pokorný

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Flux

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Ion Current Density and Ion Energy Distributions at the Electron Cyclotron Resonance Position in the Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.423 ◽

1991 ◽

Vol 30 (Part 1, No. 2) ◽

pp. 423-427 ◽

Cited By ~ 11

Author(s):

Seiji Samukawa ◽

Yukito Nakagawa ◽

Kei Ikeda

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Current ◽

Energy Distributions ◽

Resonance Position ◽

Ion Energy ◽

Ion Energy Distributions ◽

Ion Current Density ◽

Resonance Plasma

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Radial ion energy measurements in an electron cyclotron resonance reactor

10.1117/12.48944 ◽

1991 ◽

Cited By ~ 4

Author(s):

James A. O'Neill ◽

William M. Holber ◽

John Caughman

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Energy

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Doppler shift measurements of ion energy distribution widths in an electron cyclotron resonance/multipole hybrid reactor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577873 ◽

1992 ◽

Vol 10 (5) ◽

pp. 3114-3118 ◽

Cited By ~ 10

Author(s):

John Forster ◽

C. Chris Klepper ◽

Lee A. Berry ◽

S. M. Gorbatkin

Keyword(s):

Energy Distribution ◽

Doppler Shift ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Hybrid Reactor ◽

Ion Energy ◽

Ion Energy Distribution

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Control of ion energy using a screen-grid in an electron cyclotron resonance chemical vapour deposition system

Diamond and Related Materials ◽

10.1016/s0925-9635(98)00335-5 ◽

1999 ◽

Vol 8 (2-5) ◽

pp. 477-480 ◽

Cited By ~ 6

Author(s):

E Rusli ◽

S.F Yoon ◽

Y.S Wu ◽

H Yang ◽

J Ahn ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Cyclotron Resonance ◽

Vapour Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Electron Cyclotron ◽

Ion Energy ◽

Screen Grid

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Modelling Of The Ion Energy Spectrum In Electron Cyclotron Resonance Plasmas

IEEE Conference Record - Abstracts 1991 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1991.695614 ◽

2005 ◽

Author(s):

M.A. Hussein ◽

G.A. Emmert

Keyword(s):

Energy Spectrum ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Ion Energy

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Effect of electron cyclotron resonance generated hydrogen plasmas on carbon incorporation and interfacial quality of GaAs and AlGaAs grown by metalorganic molecular-beam epitaxy

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586182 ◽

1992 ◽

Vol 10 (5) ◽

pp. 2153 ◽

Cited By ~ 9

Author(s):

C. R. Abernathy

Keyword(s):

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Carbon Incorporation ◽

Hydrogen Plasmas ◽

Metalorganic Molecular Beam Epitaxy

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Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578540 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1283-1288 ◽

Cited By ~ 65

Author(s):

J. Ding ◽

J.‐S. Jenq ◽

G.‐H. Kim ◽

H. L. Maynard ◽

J. S. Hamers ◽

...

Keyword(s):

Energy Flux ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Etching Rate ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Atomic Fluorine ◽

Resonance Plasma

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Influence of mixture compositions on ion energy distributions in Ar/N2 electron cyclotron resonance plasma

Vacuum ◽

10.1016/j.vacuum.2015.05.020 ◽

2015 ◽

Vol 119 ◽

pp. 174-178 ◽

Cited By ~ 2

Author(s):

Y.C. Zhang ◽

X.H. Xie ◽

H. Li ◽

K. Yang ◽

Z.L. Tang ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Energy Distributions ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Ion Energy Distributions ◽

Resonance Plasma

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