Dependence of etch characteristics on charge particles as measured by Langmuir probe in a multipolar electron cyclotron resonance source

1994 ◽  
Vol 12 (1) ◽  
pp. 69-74 ◽  
Author(s):  
K. T. Sung ◽  
W. H. Juan ◽  
S. W. Pang ◽  
M. Dahimene
Keyword(s):  
Langmuir Probe ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron

Langmuir probe analysis of distributed electron cyclotron resonance silicon nitride deposition plasma

1998 ◽  
Vol 72 (12) ◽  
pp. 1448-1450 ◽  
Author(s):  
F. Delmotte ◽  
M. C. Hugon ◽  
B. Agius ◽  
A. M. Pointu ◽  
S. Teodoru
Keyword(s):  
Silicon Nitride ◽  
Langmuir Probe ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Probe Analysis

A langmuir probe investigation of electron cyclotron resonance argon-hydrogen plasmas

2005 ◽  
Vol 34 (6) ◽  
pp. 733-739 ◽  
Author(s):  
A. J. Stoltz ◽  
M. J. Sperry ◽  
J. D. Benson ◽  
J. B. Varesi ◽  
M. Martinka ◽  
...  
Keyword(s):  
Langmuir Probe ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Hydrogen Plasmas ◽  
Probe Investigation
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