In situ substrate surface cleaning by low‐energy ion bombardment for high quality thin film formation

1993 ◽  
Vol 11 (2) ◽  
pp. 307-313 ◽  
Author(s):  
Y. Aoki ◽  
S. Aoyama ◽  
H. Uetake ◽  
K. Morizuka ◽  
T. Ohmi
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Substrate Surface ◽  
Ion Bombardment ◽  
Surface Cleaning ◽  
Low Energy ◽  
High Quality ◽  
Thin Film Formation

Extraction of low-energy negative oxygen ions for thin film formation

2011 ◽  
Author(s):  
M. Vasquez ◽  
D. Sasaki ◽  
T. Kasuya ◽  
S. Maeno ◽  
M. Wada ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Low Energy ◽  
Oxygen Ions ◽  
Thin Film Formation

Characterization of HfO N thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

2015 ◽  
Vol 349 ◽  
pp. 757-762 ◽  
Author(s):  
Young Bok Lee ◽  
Il-Kwon Oh ◽  
Edward Namkyu Cho ◽  
Pyung Moon ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Formation ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Thin Film Formation

In Situ Investigations of Thin Film Formation by Reactive Sputtering

2005 ◽  
pp. 963 ◽  
Author(s):  
K. Bruder ◽  
P. Keil ◽  
D. LtzenkirchenHecht ◽  
R. Frahm
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Reactive Sputtering ◽  
Thin Film Formation

Intrinsic Stress in Sputtered Thin Films

1994 ◽  
Vol 356 ◽  
Author(s):  
Tai D. Nguyen ◽  
Tue Nguyen ◽  
James H. Underwood
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Formation ◽  
Substrate Surface ◽  
Dynamics Simulation ◽  
Intrinsic Stress ◽  
Stress Evolution ◽  
X Ray ◽  
Measured Stress ◽  
Thin Film Formation

AbstractUnderstanding of the stress in thin films is important in controls of the properties of nanometer period x-ray multilayers. Stress evolution at the initial stages of thin film formation was studied by molecular dynamics simulation of Mo atoms impinging on a 5×5×5 unit cell Mo substrate. The simulation shows that the structure initially increases in a compressive state. The stress then decreases when the deposited atoms have covered the substrate surface. Measured stress of Ru films in Ru/C multilayers by laser curvature technique shows similar behavior to the simulated results.

In Situ Fluorescence Probing of the Chemical Changes during Sol-Gel Thin Film Formation

1995 ◽  
Vol 78 (6) ◽  
pp. 1640-1648 ◽  
Author(s):  
Fumito Nishida ◽  
John M. McKiernan ◽  
Bruce Dunn ◽  
Jeffrey I. Zink ◽  
C. Jeffrey Brinker ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Sol Gel ◽  
Chemical Changes ◽  
Fluorescence Probing ◽  
Thin Film Formation

Investigating two-step MAPbI3 thin film formation during spin coating by simultaneous in situ absorption and photoluminescence spectroscopy

2020 ◽  
Vol 8 (10) ◽  
pp. 5086-5094 ◽  
Author(s):  
Mihirsinh Chauhan ◽  
Yu Zhong ◽  
Konstantin Schötz ◽  
Brijesh Tripathi ◽  
Anna Köhler ◽  
...  
Keyword(s):  
Thin Film ◽  
Spin Coating ◽  
Film Formation ◽  
Photoluminescence Spectroscopy ◽  
Thin Film Formation ◽  
In Situ Absorption

Here we investigate the two-step MAPbI3 thin film formation during spin coating by simultaneous in situ absorption and photoluminescence spectroscopy.

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