Measurements of the Cl atom concentration in radio‐frequency and microwave plasmas by two‐photon laser‐induced fluorescence: Relation to the etching of Si

1992 ◽  
Vol 10 (4) ◽  
pp. 1071-1079 ◽  
Author(s):  
Kouichi Ono ◽  
Tatsuo Oomori ◽  
Mutumi Tuda ◽  
Keisuke Namba
1992 ◽  
Vol 31 (Part 2, No. 3A) ◽  
pp. L269-L272 ◽  
Author(s):  
Kouichi Ono ◽  
Tatsuo Oomori ◽  
Mutumi Tuda

1999 ◽  
Vol 85 (2) ◽  
pp. 696-702 ◽  
Author(s):  
L. Chérigier ◽  
U. Czarnetzki ◽  
D. Luggenhölscher ◽  
V. Schulz-von der Gathen ◽  
H. F. Döbele

1984 ◽  
Vol 38 ◽  
Author(s):  
R. Walkup ◽  
K. Saenger ◽  
G. S. Selwyn

AbstractWe report quantitative measurements of the concentration of atomic oxygen in RF plasmas determined by two-photon laser induced fluorescence. The results are compared with concurrent measurements of spatially resolved plasma induced optical emission. These measurements establish: (1) the O atom concentration as a function of plasma parameters, (2) a semi-quantitative relationship between O* emission intensity normalized by Ar* in-tensity and O atom concentration, and (3) an understanding of the mechanisms for pro-duction of excited atoms in the plasma.


1991 ◽  
Author(s):  
R. MILES ◽  
W. LEMPERT ◽  
V. KUMAR ◽  
G. DISKIN

Plasma ◽  
2021 ◽  
Vol 4 (1) ◽  
pp. 145-171
Author(s):  
Kristaq Gazeli ◽  
Guillaume Lombardi ◽  
Xavier Aubert ◽  
Corinne Y. Duluard ◽  
Swaminathan Prasanna ◽  
...  

Recent developments in plasma science and technology have opened new areas of research both for fundamental purposes (e.g., description of key physical phenomena involved in laboratory plasmas) and novel applications (material synthesis, microelectronics, thin film deposition, biomedicine, environment, flow control, to name a few). With the increasing availability of advanced optical diagnostics (fast framing imaging, gas flow visualization, emission/absorption spectroscopy, etc.), a better understanding of the physicochemical processes taking place in different electrical discharges has been achieved. In this direction, the implementation of fast (ns) and ultrafast (ps and fs) lasers has been essential for the precise determination of the electron density and temperature, the axial and radial gradients of electric fields, the gas temperature, and the absolute density of ground-state reactive atoms and molecules in non-equilibrium plasmas. For those species, the use of laser-based spectroscopy has led to their in situ quantification with high temporal and spatial resolution, with excellent sensitivity. The present review is dedicated to the advances of two-photon absorption laser induced fluorescence (TALIF) techniques for the measurement of reactive species densities (particularly atoms such as N, H and O) in a wide range of pressures in plasmas and flames. The requirements for the appropriate implementation of TALIF techniques as well as their fundamental principles are presented based on representative published works. The limitations on the density determination imposed by different factors are also discussed. These may refer to the increasing pressure of the probed medium (leading to a significant collisional quenching of excited states), and other issues originating in the high instantaneous power density of the lasers used (such as photodissociation, amplified stimulated emission, and photoionization, resulting to the saturation of the optical transition of interest).


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