Discharge characteristics of bucket‐type ion source using a microwave plasma cathode

1990 ◽  
Vol 8 (3) ◽  
pp. 1831-1834 ◽  
Author(s):  
Y. Hakamata ◽  
T. Iga ◽  
Y. Ono ◽  
K. Natsui ◽  
T. Sato
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
Plasma Cathode ◽  
Discharge Characteristics

Development of oxygen ion source with microwave plasma cathode

1992 ◽  
Vol 63 (4) ◽  
pp. 2595-2597 ◽  
Author(s):  
Yoshio Matsubara ◽  
Hideaki Tahara ◽  
Masato Takahashi ◽  
Shuichi Nogawa ◽  
Junzo Ishikawa
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
Plasma Cathode ◽  
Oxygen Ion

Discharge mechanism of the Kyoto University‐type microwave plasma cathode or microwave ion source

1994 ◽  
Vol 65 (4) ◽  
pp. 1127-1128 ◽  
Author(s):  
Yusheng Rao ◽  
Jiannan Wu ◽  
Yuhong Yan ◽  
Yong Zhang ◽  
Lei Qi
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
Plasma Cathode ◽  
Discharge Mechanism ◽  
Microwave Ion Source

A microwave plasma cathode for the high‐current CHORDIS ion source

1996 ◽  
Vol 67 (3) ◽  
pp. 1344-1346 ◽  
Author(s):  
G. Cojocaru ◽  
B. H. Wolf ◽  
H. Emig
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
High Current ◽  
Plasma Cathode

Bucket type ion source using a microwave plasma cathode

1989 ◽  
Vol 37-38 ◽  
pp. 143-146 ◽  
Author(s):  
Yoshimi Hakamata ◽  
Takashi Iga ◽  
Ken'ichi Natsui ◽  
Tadashi Sato
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
Plasma Cathode

Improvement of the gas efficiency in a microwave plasma cathode type oxygen ion source

1994 ◽  
Vol 65 (4) ◽  
pp. 1313-1315 ◽  
Author(s):  
Koji Miyake ◽  
Takashi Mikami ◽  
Hideaki Tahara ◽  
Kiyoshi Ogata ◽  
Yoshio Matsubara ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Ion Source ◽  
Plasma Cathode ◽  
Oxygen Ion ◽  
Gas Efficiency

Ion-emission properties of a plasma in a gaseous-ion source with a plasma cathode

2004 ◽  
Vol 49 (1) ◽  
pp. 19-21
Author(s):  
N. V. Gavrilov ◽  
A. S. Kamenetskikh
Keyword(s):  
Ion Source ◽  
Plasma Cathode ◽  
Emission Properties ◽  
Ion Emission

Large-Area Doping for Poly-Si Thin Film Transistors Using Bucket Ion Source with an RF Plasma Cathode

1991 ◽  
Vol 30 (Part 2, No. 4B) ◽  
pp. L772-L774
Author(s):  
Genshiro Kawachi ◽  
Takashi Aoyama ◽  
Takaya Suzuki ◽  
Yasunori Ohno ◽  
Akio Mimura ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Ion Source ◽  
Rf Plasma ◽  
Large Area ◽  
Plasma Cathode ◽  
Si Thin Film

A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System

2005 ◽  
Vol 107 ◽  
pp. 21-24 ◽  
Author(s):  
M. Medhisuwakul ◽  
Thiraphat Vilaithong ◽  
Jürgen Engemann
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Source ◽  
Ion Source ◽  
Simulation Software ◽  
Ion Current ◽  
Extraction System ◽  
Beam Shape ◽  
Ion Extraction ◽  
Argon Ion

A 13.56 MHz radio-frequency (rf) driven multicusp ion source has been constructed [1] to produce a high argon ion current density. Milliampere-range argon ion current can be extracted from the source. An in-waveguide microwave plasma source has been utilized as the ion beam neutralizer [2]. The neutralization source was placed 20 cm downstream from the extraction system. With the former extraction system, comprised of extraction electrodes and an Einzel lens, the electrons from the neutralizer were attracted to the high positive potential of the lens. Consequently, the potential of the lens drops and the beam is diverged. To suppress electrons from being accelerated to the Einzel lens a negatively biased electrode was placed before the last electrode, which is grounded, to produce a retarding electric field for electrons. The hole of the electrode was made small to make sure that the potential at the center is negative enough to suppress electrons. All simulations have been performed with the KOBRA3-INP simulation software. The results of the beam shape from the simulation will be presented.

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