Electron diffusion length and escape probability measurements for p‐type GaAs(100) epitaxies

1990 ◽  
Vol 8 (5) ◽  
pp. 3676-3681 ◽  
Author(s):  
G. Vergara ◽  
L. J. Gómez ◽  
J. Presa ◽  
M. T. Montojo
2018 ◽  
Vol 123 (23) ◽  
pp. 235104 ◽  
Author(s):  
Jonathan Lee ◽  
Chris J. Fredricksen ◽  
Elena Flitsiyan ◽  
Robert E. Peale ◽  
Leonid Chernyak ◽  
...  

2000 ◽  
Vol 77 (6) ◽  
pp. 875-877 ◽  
Author(s):  
Leonid Chernyak ◽  
Andrei Osinsky ◽  
Vladimir Fuflyigin ◽  
E. F. Schubert

1998 ◽  
Vol 73 (22) ◽  
pp. 3276-3278 ◽  
Author(s):  
Z. Z. Bandić ◽  
P. M. Bridger ◽  
E. C. Piquette ◽  
T. C. McGill

1987 ◽  
Vol 102 ◽  
Author(s):  
J. L. Bradshaw ◽  
W. J. Choyke ◽  
Z. C. Feng ◽  
D. L. Meier ◽  
R. L. Messham

ABSTRACTVarious thicknesses of AlGaAs are grown on GaAs substrates by MOCVD. Low temperature photoluminescence of the substrate is observed even for layers of AlGaAs 24μm thick. Direct excitation by the 488.0 nm pumping radiation and excitation by reradiation from the AlGaAs are eliminated as causes. From photoluminescence and EBIC studies, evidence is given to show that the substrate luminescence is caused by a much larger than expected electron diffusion length. A small trace of GaAs luminescence may be due to alloy segregation in the AlGaAs films themselves.


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