Very‐low outgassing rate, separable, aluminum‐flanged, hot‐cathode ion source for a residual gas analyzer

1990 ◽  
Vol 8 (5) ◽  
pp. 3890-3891 ◽  
Author(s):  
Fumio Watanabe
Keyword(s):  
Ion Source ◽  
Gas Analyzer ◽  
Residual Gas ◽  
Outgassing Rate

Optimization of closed ion source for a high-sensitivity residual gas analyzer

2014 ◽  
Vol 32 (2) ◽  
pp. 021603
Author(s):  
Cheolsu Han ◽  
Jong Rok Ahn ◽  
Sang Jung Ahn ◽  
Chang Joon Park
Keyword(s):  
High Sensitivity ◽  
Ion Source ◽  
Gas Analyzer ◽  
Residual Gas

scholarly journals Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer

Materials ◽  
2021 ◽  
Vol 14 (11) ◽  
pp. 3026
Author(s):  
Woo-Jae Kim ◽  
In-Young Bang ◽  
Ji-Hwan Kim ◽  
Yeon-Soo Park ◽  
Hee-Tae Kwon ◽  
...  
Keyword(s):  
Greenhouse Gas ◽  
Silicon Oxide ◽  
Gas Analysis ◽  
Gas Analyzer ◽  
Dc Offset ◽  
Cleaning Performance ◽  
Oxide Etching ◽  
Residual Gas ◽  
Etch Rates ◽  
Very High

The use of NF3 is significantly increasing every year. However, NF3 is a greenhouse gas with a very high global warming potential. Therefore, the development of a material to replace NF3 is required. F3NO is considered a potential replacement to NF3. In this study, the characteristics and cleaning performance of the F3NO plasma to replace the greenhouse gas NF3 were examined. Etching of SiO2 thin films was performed, the DC offset of the plasma of both gases (i.e., NF3 and F3NO) was analyzed, and a residual gas analysis was performed. Based on the analysis results, the characteristics of the F3NO plasma were studied, and the SiO2 etch rates of the NF3 and F3NO plasmas were compared. The results show that the etch rates of the two gases have a difference of 95% on average, and therefore, the cleaning performance of the F3NO plasma was demonstrated, and the potential benefit of replacing NF3 with F3NO was confirmed.

Measurement of partial pressures in extremely high vacuum region using a modified residual gas analyzer

1999 ◽  
Vol 70 (3) ◽  
pp. 1880-1884 ◽  
Author(s):  
Shu Watanabe ◽  
Hitoshi Oyama ◽  
Shigeki Kato ◽  
Masakazu Aono
Keyword(s):  
High Vacuum ◽  
Gas Analyzer ◽  
Vacuum Region ◽  
Partial Pressures ◽  
Residual Gas
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