Measurement of partial pressures in extremely high vacuum region using a modified residual gas analyzer

1999 ◽  
Vol 70 (3) ◽  
pp. 1880-1884 ◽  
Author(s):  
Shu Watanabe ◽  
Hitoshi Oyama ◽  
Shigeki Kato ◽  
Masakazu Aono
Keyword(s):  
High Vacuum ◽  
Gas Analyzer ◽  
Vacuum Region ◽  
Partial Pressures ◽  
Residual Gas

scholarly journals Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer

Materials ◽  
2021 ◽  
Vol 14 (11) ◽  
pp. 3026
Author(s):  
Woo-Jae Kim ◽  
In-Young Bang ◽  
Ji-Hwan Kim ◽  
Yeon-Soo Park ◽  
Hee-Tae Kwon ◽  
...  
Keyword(s):  
Greenhouse Gas ◽  
Silicon Oxide ◽  
Gas Analysis ◽  
Gas Analyzer ◽  
Dc Offset ◽  
Cleaning Performance ◽  
Oxide Etching ◽  
Residual Gas ◽  
Etch Rates ◽  
Very High

The use of NF3 is significantly increasing every year. However, NF3 is a greenhouse gas with a very high global warming potential. Therefore, the development of a material to replace NF3 is required. F3NO is considered a potential replacement to NF3. In this study, the characteristics and cleaning performance of the F3NO plasma to replace the greenhouse gas NF3 were examined. Etching of SiO2 thin films was performed, the DC offset of the plasma of both gases (i.e., NF3 and F3NO) was analyzed, and a residual gas analysis was performed. Based on the analysis results, the characteristics of the F3NO plasma were studied, and the SiO2 etch rates of the NF3 and F3NO plasmas were compared. The results show that the etch rates of the two gases have a difference of 95% on average, and therefore, the cleaning performance of the F3NO plasma was demonstrated, and the potential benefit of replacing NF3 with F3NO was confirmed.

scholarly journals Laser power meters as an X-ray power diagnostic for LCLS-II

2018 ◽  
Vol 25 (1) ◽  
pp. 72-76 ◽  
Author(s):  
Philip Heimann ◽  
Stefan Moeller ◽  
Sergio Carbajo ◽  
Sanghoon Song ◽  
Georgi Dakovski ◽  
...  
Keyword(s):  
Free Electron Laser ◽  
Laser Power ◽  
High Vacuum ◽  
Average Power ◽  
Gas Analysis ◽  
Ultra High Vacuum ◽  
Beam Path ◽  
X Ray ◽  
High Repetition ◽  
Residual Gas

For the LCLS-II X-ray instruments, laser power meters are being developed as compact X-ray power diagnostics to operate at soft and tender X-ray photon energies. These diagnostics can be installed at various locations along an X-ray free-electron laser (FEL) beamline in order to monitor the transmission of X-ray optics along the beam path. In addition, the power meters will be used to determine the absolute X-ray power at the endstations. Here, thermopile power meters, which measure average power, and have been chosen primarily for their compatibility with the high repetition rates at LCLS-II, are evaluated. A number of characteristics in the soft X-ray range are presented including linearity, calibrations conducted with a photodiode and a gas monitor detector as well as ultra-high-vacuum compatibility tests using residual gas analysis. The application of these power meters for LCLS-II and other X-ray FEL sources is discussed.

scholarly journals Device for calibration of low pressure gauges development

2002 ◽  
Vol 2 (4) ◽  
pp. 189-195
Author(s):  
Z.D. Nikitovic
Keyword(s):  
High Vacuum ◽  
Low Pressure ◽  
Calibration Procedure ◽  
Vacuum System ◽  
Molecular Collision ◽  
Gas Discharges ◽  
Dry Air ◽  
Vacuum Region ◽  
Set Up ◽  
Made In

Vacuum system set-up is presented and used for calibration of pressure gauges in the region of rough vacuum, from 103 mbar to 10-1 mbar, with dry air. The capacitance manometer is used for the calibration of piezoresistant manometer, oil, mercury and mercury micrometers U manometers. The applicability of the experimental set-up and obtained results for the low pressure gauges calibration in the medium and high vacuum region is approved. It was shown how calibration of some cheaper pressure gauges might be performed and reliable measurements of the pressure may be made in the region that is of interest for atomic and molecular collision physics and low-pressure gas discharges. It was also shown that mentioned calibration procedure could be used for calibration of different U manometer types in order to renormalize older atomic and molecular collision data.

Residual gas analysers and their use in high vacuum systems

Vacuum ◽  
1987 ◽  
Vol 37 (3-4) ◽  
pp. 335-338 ◽  
Author(s):  
F.M. Mao ◽  
J.M. Yang ◽  
W.E. Austin ◽  
J.H. Heck
Keyword(s):  
High Vacuum ◽  
Residual Gas ◽  
Vacuum Systems
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