Plasma characterization of an electron cyclotron resonance–radio‐frequency hybrid plasma reactor

Young H. Lee; John E. Heidenreich; Guadalupe Fortuno

doi:10.1116/1.575818

Plasma characterization of an electron cyclotron resonance–radio‐frequency hybrid plasma reactor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575818 ◽

1989 ◽

Vol 7 (3) ◽

pp. 903-907 ◽

Cited By ~ 33

Author(s):

Young H. Lee ◽

John E. Heidenreich ◽

Guadalupe Fortuno

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Hybrid Plasma ◽

Plasma Characterization

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Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma

Acta Physica Sinica ◽

10.7498/aps.59.1338 ◽

2010 ◽

Vol 59 (2) ◽

pp. 1338

Author(s):

Ke Bo ◽

Wang Lei ◽

Ni Tian-Ling ◽

Ding Fang ◽

Chen Mu-Di ◽

...

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Hybrid Plasma

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Role of bias frequency in a dual electron cyclotron resonance-radio-frequency hybrid plasma

Vacuum ◽

10.1016/j.vacuum.2009.07.009 ◽

2009 ◽

Vol 84 (2) ◽

pp. 348-351 ◽

Cited By ~ 3

Author(s):

L. Wang ◽

B. Ke ◽

T.L. Ni ◽

F. Ding ◽

M.D. Chen ◽

...

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Hybrid Plasma

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Electron cyclotron resonance radio-frequency hybrid plasma-deposited diamond-like carbon as an optical material

10.1117/12.22464 ◽

1990 ◽

Author(s):

Sri S. Sritharan ◽

John S. Wilson ◽

Pierre R. Barbier ◽

Jacques I. Pankove

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Optical Material ◽

Diamond Like Carbon ◽

Hybrid Plasma

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Chemical and electrical characterization of AlGaAs/GaAs heterojunction bipolar transistors treated by electron cyclotron resonance plasmas

Applied Physics Letters ◽

10.1063/1.107122 ◽

1992 ◽

Vol 60 (16) ◽

pp. 1996-1998 ◽

Cited By ~ 10

Author(s):

P. W. Li ◽

Q. Wang ◽

E. S. Yang

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Bipolar Transistors ◽

Electron Cyclotron

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Comparison of electron cyclotron resonance and radio-frequency inductively coupled plasmas of Ar and N2: Neutral kinetic energies and source gas cracking

Journal of Applied Physics ◽

10.1063/1.366916 ◽

1998 ◽

Vol 83 (4) ◽

pp. 1917-1923 ◽

Cited By ~ 6

Author(s):

N. Materer ◽

Rory S. Goodman ◽

Stephen R. Leone

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Mass spectrometric investigations on plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

Plasma Sources Science and Technology ◽

10.1088/0963-0252/7/4/018 ◽

1998 ◽

Vol 7 (4) ◽

pp. 607-616 ◽

Cited By ~ 28

Author(s):

M Zarrabian ◽

C Leteinturier ◽

G Turban

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Mass Spectrometric ◽

Electron Cyclotron ◽

Radio Frequency Discharge

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Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance

Diamond and Related Materials ◽

10.1016/j.diamond.2008.01.036 ◽

2008 ◽

Vol 17 (7-10) ◽

pp. 1710-1715 ◽

Cited By ~ 6

Author(s):

M. Kihel ◽

R. Clergereaux ◽

D. Escaich ◽

M. Calafat ◽

P. Raynaud ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron

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Etch characterization of a broad‐beam electron cyclotron resonance ion source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576610 ◽

1990 ◽

Vol 8 (3) ◽

pp. 2945-2949 ◽

Cited By ~ 1

Author(s):

E. Ghanbari ◽

T. Nguyen ◽

S. Bui ◽

E. Ostan

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Source ◽

Electron Cyclotron ◽

Beam Electron ◽

Broad Beam

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Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Operational characteristics of SF6 etching in an electron cyclotron resonance plasma reactor

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585612 ◽

1991 ◽

Vol 9 (2) ◽

pp. 318 ◽

Cited By ~ 29

Author(s):

J. L. Cecchi

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Operational Characteristics ◽

Resonance Plasma

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