Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devices

1985 ◽  
Vol 3 (3) ◽  
pp. 867-872 ◽  
Author(s):  
P. D. Richard ◽  
R. J. Markunas ◽  
G. Lucovsky ◽  
G. G. Fountain ◽  
A. N. Mansour ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Remote Plasma ◽  
Gate Insulators ◽  
Plasma Enhanced Cvd

scholarly journals A study of remote plasma enhanced CVD of silicon nitride films

1993 ◽  
Vol 03 (C3) ◽  
pp. C3-233-C3-240 ◽  
Author(s):  
S. E. ALEXANDROV ◽  
M. L. HITCHMAN ◽  
S. SHAMLIAN
Keyword(s):  
Silicon Nitride ◽  
Remote Plasma ◽  
Plasma Enhanced Cvd ◽  
Silicon Nitride Films

Remote Plasma-Enhanced CVD of Fluorinated Silicon Nitride Films

1997 ◽  
Vol 3 (3) ◽  
pp. 111-117 ◽  
Author(s):  
Sergei E. Alexandrov ◽  
Michael L. Hitchman
Keyword(s):  
Silicon Nitride ◽  
Remote Plasma ◽  
Plasma Enhanced Cvd ◽  
Silicon Nitride Films

Temperature dependence of the etch rate and selectivity of silicon nitride over silicon dioxide in remote plasma NF3/Cl2

1995 ◽  
Vol 67 (13) ◽  
pp. 1902-1904 ◽  
Author(s):  
J. Staffa ◽  
D. Hwang ◽  
B. Luther ◽  
J. Ruzyllo ◽  
R. Grant
Keyword(s):  
Silicon Nitride ◽  
Silicon Dioxide ◽  
Temperature Dependence ◽  
Etch Rate ◽  
Remote Plasma
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