X‐ray photoelectron spectroscopy studies of thin films of TiNx having different annealing histories

1985 ◽  
Vol 3 (5) ◽  
pp. 1969-1972 ◽  
Author(s):  
Nurit Kaufherr ◽  
David Lichtman
2018 ◽  
Vol 10 ◽  
pp. 129-135 ◽  
Author(s):  
Nanan Li ◽  
Pengfei Zhu ◽  
Yang Chen ◽  
Xiulan Duan ◽  
Fapeng Yu

2021 ◽  
Author(s):  
Ghada El Jamal ◽  
Thomas Gouder ◽  
Rachel Eloirdi ◽  
Mats Jonsson

We report surface characteristics of UO2, U2O5 and UO3 thin films after exposure to gas plasmas: a new approach of the oxidative dissolution problem.


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