X‐ray photoelectron spectroscopy studies ofn‐type bismuth‐modified amorphous thin films of Ge20Se80and As2Se3

1992 ◽  
Vol 72 (5) ◽  
pp. 2066-2068 ◽  
Author(s):  
Sunil Kumar ◽  
Subhash C. Kashyap ◽  
K. L. Chopra
2018 ◽  
Vol 10 ◽  
pp. 129-135 ◽  
Author(s):  
Nanan Li ◽  
Pengfei Zhu ◽  
Yang Chen ◽  
Xiulan Duan ◽  
Fapeng Yu

2021 ◽  
Author(s):  
Ghada El Jamal ◽  
Thomas Gouder ◽  
Rachel Eloirdi ◽  
Mats Jonsson

We report surface characteristics of UO2, U2O5 and UO3 thin films after exposure to gas plasmas: a new approach of the oxidative dissolution problem.


Sign in / Sign up

Export Citation Format

Share Document