scholarly journals X-Ray and ultraviolet photoelectron spectroscopy studies of Uranium(iv),(v) and(vi) exposed to H2O-plasma under UHV conditions

2021 ◽  
Author(s):  
Ghada El Jamal ◽  
Thomas Gouder ◽  
Rachel Eloirdi ◽  
Mats Jonsson

We report surface characteristics of UO2, U2O5 and UO3 thin films after exposure to gas plasmas: a new approach of the oxidative dissolution problem.

2018 ◽  
Vol 10 ◽  
pp. 129-135 ◽  
Author(s):  
Nanan Li ◽  
Pengfei Zhu ◽  
Yang Chen ◽  
Xiulan Duan ◽  
Fapeng Yu

1997 ◽  
Vol 12 (6) ◽  
pp. 1433-1436 ◽  
Author(s):  
A. Iembo ◽  
F. Fuso ◽  
E. Arimondo ◽  
C. Ciofi ◽  
G. Pennelli ◽  
...  

RuO2 thin films have been produced on silicon-based substrates by in situ pulsed laser deposition for the first time. The electrical properties, the surface characteristics, the crystalline structure, and the film-substrate interface of deposited samples have been investigated by 4-probe resistance versus temperature technique, scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction, and transmission electron microscopy, respectively. The films show good electrical properties. The RuO2-substrate interface is very thin (≈3 nm), since it is not degraded by any annealing process. These two characteristics render our films suitable to be used as electrodes in PZT-based capacitors.


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