Summary Abstract: Polycrystalline CdS films with large photoconductive gain grown by reactive sputtering

1981 ◽  
Vol 18 (2) ◽  
pp. 382-383 ◽  
Author(s):  
J. R. Clarke ◽  
J. E. Greene
Keyword(s):  
Reactive Sputtering ◽  
Photoconductive Gain ◽  
Cds Films

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

Transparency Improvement of SiCO Thin Film for Optical Waveguide with Reactive Sputtering Method

2020 ◽  
Vol 140 (12) ◽  
pp. 369-373
Author(s):  
Hiroyuki Nikkuni ◽  
Chizuru Numata ◽  
Ryoto Yamaji ◽  
Hiroshi Ito ◽  
Yoshio Kawamata
Keyword(s):  
Thin Film ◽  
Optical Waveguide ◽  
Reactive Sputtering

High Rate Deposition of Al-doped ZnO (AZO) by Reactive Sputtering (1); Unipolar Pulsing with Plasma Emission Control

2008 ◽  
Author(s):  
Yuzo Shigesato ◽  
Kento Hirohata ◽  
Yasutaka Nishi ◽  
Nobuto Oka ◽  
Yasushi Sato ◽  
...  
Keyword(s):  
Emission Control ◽  
Reactive Sputtering ◽  
High Rate ◽  
Plasma Emission ◽  
Doped Zno

Preparation of CdS Thin Films by Reactive Sputtering Method

Shinku ◽  
1974 ◽  
Vol 17 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Hiroharu HIRABAYASHI ◽  
Minoru NOGAMI
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Cds Thin Films

scholarly journals Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites

PLoS ONE ◽  
2015 ◽  
Vol 10 (7) ◽  
pp. e0133479 ◽  
Author(s):  
Khaled Sayed Elbadawi Ramadan ◽  
Stephane Evoy
Keyword(s):  
Low Temperature ◽  
Aluminum Nitride ◽  
Reactive Sputtering ◽  
Thin Aluminum

scholarly journals Effects of Nitrogen Partial Pressure on the Properties of Al-Cr-N Films Prepared by DC Reactive Sputtering

2004 ◽  
Vol 55 (4) ◽  
pp. 271-275
Author(s):  
Yukio IDE ◽  
Satoshi NAKAMURA ◽  
Akihiro NINO ◽  
Katsuhiko KISHITAKE
Keyword(s):  
Partial Pressure ◽  
Reactive Sputtering ◽  
Nitrogen Partial Pressure

Effect of Kr/O2-Plasma Reactive Sputtering on Ferroelectric Nondoped HfO₂ Formation for MFSFET With Pt Gate Electrode

2021 ◽  
Vol 68 (5) ◽  
pp. 2427-2433
Author(s):  
S. Ohmi ◽  
M. G. Kim ◽  
M. Kataoka ◽  
M. Hayashi ◽  
R. M. D. Mailig
Keyword(s):  
Reactive Sputtering ◽  
Gate Electrode ◽  
O2 Plasma

Spray pyrolysis deposited Cr and In doped CdS films for laser application

2021 ◽  
Vol 117 ◽  
pp. 111153
Author(s):  
Evgeny Gavrishchuk ◽  
Dmitry Savin ◽  
Tatyana Tomilova ◽  
Vladimir Ikonnikov ◽  
Sergey Kurashkin ◽  
...  
Keyword(s):  
Spray Pyrolysis ◽  
Laser Application ◽  
Cds Films

Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

1990 ◽  
Vol 5 (4) ◽  
pp. 677-679 ◽  
Author(s):  
A. J. Drehman ◽  
M. W. Dumais
Keyword(s):  
Thin Films ◽  
Strontium Titanate ◽  
Reactive Sputtering ◽  
Negative Bias ◽  
Superconducting Thin Films ◽  
Substrate Bias ◽  
Composition Control ◽  
Zero Resistance

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

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