New hybrid (e‐beam/x‐ray) exposure technique for high aspect ratio microstructure fabrication

1979 ◽  
Vol 16 (6) ◽  
pp. 1631-1634 ◽  
Author(s):  
M. Hatzakis ◽  
D. Hofer ◽  
T. H. P. Chang
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
X Ray ◽  
Microstructure Fabrication ◽  
High Aspect Ratio Microstructure ◽  
Exposure Technique

Graphite membrane applied for high-aspect-ratio microstructure fabrication

2000 ◽  
Author(s):  
Hsiharng Yang ◽  
Min-Chieh Chou ◽  
Horng-Jey Wang ◽  
Chengtang Pan ◽  
Jiang Long Lin
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Microstructure Fabrication ◽  
High Aspect Ratio Microstructure

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

2017 ◽  
Vol 170 ◽  
pp. 49-53 ◽  
Author(s):  
Jun Zhao ◽  
Yanqing Wu ◽  
Chaofan Xue ◽  
Shumin Yang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Periodic Structures ◽  
Interference Lithography ◽  
X Ray

Formation of GaN Self-Organized Nanotips by Nanomasking Effect

2001 ◽  
Vol 707 ◽  
Author(s):  
Harumasa Yoshida ◽  
Tatsuhiro Urushido ◽  
Hideto Miyake ◽  
Kazumasa Hiramtsu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Aspect Ratio ◽  
Formation Mechanism ◽  
High Aspect Ratio ◽  
Photoelectron Spectroscopy ◽  
Nanometer Scale ◽  
Xps Analysis ◽  
X Ray ◽  
Self Organized

ABSTRACTWe have successfully fabricated self-organized GaN nanotips by reactive ion etching using chlorine plasma, and have revealed the formation mechanism. Nanotips with a high density and a high aspect ratio have been formed after the etching. We deduce from X-ray photoelectron spectroscopy (XPS) analysis that the nanotip formation is attributed to nanometer-scale masks of SiO2 on GaN. The structures calculated by Monte Carlo simulation of our formation mechanism are very similar to the experimental nanotip structures.

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