UHV facility for metal–semiconductor thin‐film studies

C. A. Crider; J. M. Poate; J. E. Rowe

doi:10.1116/1.569482

UHV facility for metal–semiconductor thin‐film studies

Journal of Vacuum Science and Technology ◽

10.1116/1.569482 ◽

1978 ◽

Vol 15 (2) ◽

pp. 215-218 ◽

Cited By ~ 4

Author(s):

C. A. Crider ◽

J. M. Poate ◽

J. E. Rowe

Keyword(s):

Thin Film ◽

Film Studies ◽

Semiconductor Thin Film

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3940. Uhv facility for metal—semiconductor thin-film studies. (USA)

Vacuum ◽

10.1016/s0042-207x(79)80828-3 ◽

1979 ◽

Vol 29 (4-5) ◽

pp. 195

Keyword(s):

Thin Film ◽

Film Studies ◽

Semiconductor Thin Film

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Helicity dependent temporal profile of the semiconductor thin film photoresponse

Applied Physics Letters ◽

10.1063/5.0051082 ◽

2021 ◽

Vol 118 (20) ◽

pp. 201105

Author(s):

Gennady M. Mikheev ◽

Arseniy E. Fateev ◽

Vladimir Ya. Kogai ◽

Tatyana N. Mogileva ◽

Viatcheslav V. Vanyukov ◽

...

Keyword(s):

Thin Film ◽

Temporal Profile ◽

Semiconductor Thin Film

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Analysis of Carrier Mobility in Amorphous Metal-Oxide Semiconductor Thin-Film Transistor using Hall Effect

IEEE Electron Device Letters ◽

10.1109/led.2020.2993268 ◽

2020 ◽

pp. 1-1

Author(s):

Kota Imanishi ◽

Tokiyoshi Matsuda ◽

Mutsumi Kimura

Keyword(s):

Thin Film ◽

Metal Oxide ◽

Hall Effect ◽

Carrier Mobility ◽

Thin Film Transistor ◽

Amorphous Metal ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Semiconductor Thin Film ◽

Amorphous Metal Oxide

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Organic Semiconductors: Solutal‐Marangoni‐Flow‐Mediated Growth of Patterned Highly Crystalline Organic Semiconductor Thin Film Via Gap‐Controlled Bar Coating (Adv. Funct. Mater. 28/2021)

Advanced Functional Materials ◽

10.1002/adfm.202170200 ◽

2021 ◽

Vol 31 (28) ◽

pp. 2170200

Author(s):

Seon Baek Lee ◽

Siyoung Lee ◽

Dae Gun Kim ◽

Seung Hyun Kim ◽

Boseok Kang ◽

...

Keyword(s):

Thin Film ◽

Organic Semiconductors ◽

Organic Semiconductor ◽

Marangoni Flow ◽

Semiconductor Thin Film ◽

Organic Semiconductor Thin Film

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Calibration of a fan-shaped beam surface plasmon resonance instrument for quantitative adsorbed thin film studies—No metal film thickness or optical properties required

Sensors and Actuators B Chemical ◽

10.1016/j.snb.2012.09.002 ◽

2013 ◽

Vol 176 ◽

pp. 736-745 ◽

Cited By ~ 7

Author(s):

Antonella Badia ◽

Ching-I Chen ◽

Lana L. Norman

Keyword(s):

Thin Film ◽

Optical Properties ◽

Surface Plasmon Resonance ◽

Film Thickness ◽

Surface Plasmon ◽

Plasmon Resonance ◽

Metal Film ◽

Film Studies ◽

Shaped Beam ◽

Beam Surface

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Optical and microstructural characterization of nanocrystalline Cu doped ZnO diluted magnetic semiconductor thin film for optoelectronic applications

Optical Materials ◽

10.1016/j.optmat.2021.111312 ◽

2021 ◽

Vol 119 ◽

pp. 111312

Author(s):

Gharieb A. Ali ◽

M. Emam-Ismail ◽

M. El-Hagary ◽

E.R. Shaaban ◽

S.H. Moustafa ◽

...

Keyword(s):

Thin Film ◽

Diluted Magnetic Semiconductor ◽

Magnetic Semiconductor ◽

Microstructural Characterization ◽

Doped Zno ◽

Semiconductor Thin Film ◽

Optoelectronic Applications ◽

Diluted Magnetic

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Preparation and Application to Enzyme Sensor of Temperature-sensitive Metal Oxide Semiconductor Thin Film.

Journal of the Japan Society of Powder and Powder Metallurgy ◽

10.2497/jjspm.47.838 ◽

2000 ◽

Vol 47 (8) ◽

pp. 838-843

Author(s):

Yoshimitsu Yachi ◽

Shigeki Chiba ◽

Hiroshi Osada ◽

Hideo Oka ◽

Kyoshiro Seki

Keyword(s):

Thin Film ◽

Metal Oxide ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Temperature Sensitive ◽

Enzyme Sensor ◽

Semiconductor Thin Film

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Facile synthesis of single-crystal of o-phenylene diamine dihydrochloride as a polychloride and fabrication of high-performance semiconductor thin film

Optical Materials ◽

10.1016/j.optmat.2020.110758 ◽

2021 ◽

Vol 112 ◽

pp. 110758

Author(s):

M. Sh Zoromba ◽

A.F. Al-Hossainy ◽

M. Rzaigui ◽

A. Abdelkader ◽

F. Alresheedi ◽

...

Keyword(s):

Thin Film ◽

Single Crystal ◽

High Performance ◽

Facile Synthesis ◽

Semiconductor Thin Film ◽

Diamine Dihydrochloride ◽

Phenylene Diamine

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Metal oxide semiconductor thin-film transistor backplanes for displays and imaging

MRS Bulletin ◽

10.1557/s43577-021-00228-8 ◽

2022 ◽

Author(s):

Denis Striakhilev ◽

Byung-kyu Park ◽

Shuenn-Jiun Tang

Keyword(s):

Thin Film ◽

Metal Oxide ◽

Thin Film Transistor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Semiconductor Thin Film

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Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5047237 ◽

2018 ◽

Vol 36 (6) ◽

pp. 060801 ◽

Cited By ~ 28

Author(s):

Jiazhen Sheng ◽

Jung-Hoon Lee ◽

Wan-Ho Choi ◽

TaeHyun Hong ◽

MinJung Kim ◽

...

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Research And Development ◽

Thin Film Transistors ◽

Atomic Layer ◽

Review Article ◽

Oxide Semiconductor ◽

Layer Deposition ◽

Semiconductor Thin Film

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