Highly uniform silicon field emitter arrays fabricated using a trilevel resist process

Nedeljko Karaulac; Girish Rughoobur; Akintunde I. Akinwande

doi:10.1116/1.5131656

Highly uniform silicon field emitter arrays fabricated using a trilevel resist process

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5131656 ◽

2020 ◽

Vol 38 (2) ◽

pp. 023201 ◽

Cited By ~ 2

Author(s):

Nedeljko Karaulac ◽

Girish Rughoobur ◽

Akintunde I. Akinwande

Keyword(s):

Field Emitter ◽

Field Emitter Arrays ◽

Highly Uniform

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Highly uniform and low turn-on voltage Si field emitter arrays fabricated using chemical mechanical polishing

IEEE Electron Device Letters ◽

10.1109/55.821669 ◽

2000 ◽

Vol 21 (2) ◽

pp. 66-69 ◽

Cited By ~ 24

Author(s):

Meng Ding ◽

Han Kim ◽

A.I. Akinwande

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Field Emitter ◽

Turn On ◽

Field Emitter Arrays ◽

Highly Uniform

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Field-Emitter Arrays for RF Vacuum Microelectronics

10.21236/ada248726 ◽

1992 ◽

Author(s):

C. A. Spindt ◽

A. Rosengreen

Keyword(s):

Field Emitter ◽

Field Emitter Arrays ◽

Vacuum Microelectronics

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Beam collimation from field-emitter arrays with linear planar lens

IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1996.551467 ◽

2002 ◽

Cited By ~ 1

Author(s):

C.-M. Tang ◽

T.A. Swyden

Keyword(s):

Field Emitter ◽

Planar Lens ◽

Field Emitter Arrays ◽

Beam Collimation

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Optically stimulated picosecond field emission pulses from gated p-silicon field emitter arrays

Applied Physics Letters ◽

10.1063/1.2710475 ◽

2007 ◽

Vol 90 (8) ◽

pp. 083506 ◽

Cited By ~ 14

Author(s):

Chin-Jen Chiang ◽

Kendrick X. Liu ◽

Jonathan P. Heritage

Keyword(s):

Field Emission ◽

Field Emitter ◽

Field Emitter Arrays

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Fabrication of Gated Field Emitter Arrays with Self-Align Lateral Resistors

10th International Conference on Vacuum Microelectronics ◽

10.1109/ivmc.1997.627661 ◽

1997 ◽

Keyword(s):

Field Emitter ◽

Field Emitter Arrays

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Field-emission characteristics of single- and double-gate all-metallic field emitter arrays fabricated by molding and self-aligned gate process

2009 22nd International Vacuum Nanoelectronics Conference ◽

10.1109/ivnc.2009.5271650 ◽

2009 ◽

Cited By ~ 1

Author(s):

S. Tsujino ◽

E. Kirk ◽

T. Vogel ◽

J. Gobrecht

Keyword(s):

Field Emission ◽

Emission Characteristics ◽

Double Gate ◽

Field Emitter ◽

Field Emitter Arrays

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Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.6926 ◽

1995 ◽

Vol 34 (Part 1, No. 12B) ◽

pp. 6926-6931 ◽

Cited By ~ 16

Author(s):

Huang-Chung Cheng ◽

Tzu-Kun Ku ◽

Biing-Bang Hsieh ◽

Sheng-Hsiung Chen ◽

Shye-Yuh Leu ◽

...

Keyword(s):

Field Emitter ◽

Field Emitter Arrays ◽

Fabrication And Characterization

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Effect of electrical aging on field emission from carbon nanotube field emitter arrays

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2884757 ◽

2008 ◽

Vol 26 (2) ◽

pp. 856 ◽

Cited By ~ 22

Author(s):

Je Hwang Ryu ◽

Ki Seo Kim ◽

Chang Seok Lee ◽

Jin Jang ◽

Kyu Chang Park

Keyword(s):

Carbon Nanotube ◽

Field Emission ◽

Field Emitter ◽

Field Emitter Arrays ◽

Electrical Aging

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Analysis of the possibility of performing microelectronic microwave vacuum devices with extended interaction on field emitter arrays

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586844 ◽

1993 ◽

Vol 11 (2) ◽

pp. 477 ◽

Cited By ~ 6

Author(s):

N. I. Sinitsyn

Keyword(s):

Field Emitter ◽

Field Emitter Arrays ◽

Extended Interaction

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Surface Modification of Si Field Emitter Arrays for Vacuum Sealing

MRS Proceedings ◽

10.1557/proc-621-q1.3.1 ◽

2000 ◽

Vol 621 ◽

Cited By ~ 2

Author(s):

M. Nagao ◽

H. Tanabe ◽

T. Kobayashi ◽

T. Matsukawa ◽

S. Kanemaru ◽

...

Keyword(s):

Plasma Treatment ◽

Vacuum Packaging ◽

Field Emitter ◽

Vacuum Sealing ◽

Field Emitter Arrays ◽

Vacuum Microelectronics ◽

Field Emission Displays ◽

Before And After ◽

Heating Treatment ◽

Field Emitter Array

ABSTRACTVacuum packaging is a very important issue for vacuum microelectronics devices, especially for field emission displays. Emission current from the field emitter array (FEA), however, is known to decrease significantly after the vacuum packaging process. The current decrease is caused by heating treatment in the vacuum sealing process. In the present paper, the effect of the heating treatment on Si FEA was investigated and CHF3 plasma treatment was proposed for avoiding the problem. The Si FEA was exposed to plasma for 15sec and emission characteristics were measured before and after the vacuum sealing process using frit. It was confirmed that CHF3 plasma treatment was very effective for avoiding the emission degradation of the Si FEA. Details of the heating damage and CHF3 plasma treatment are described.

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