Eliminating etch stop in high-density magnetic tunnel junction patterning using high-temperature CO/NH3 plasma etching

Author(s):  
Makoto Satake ◽  
Takahiro Abe ◽  
Takamasa Ichino ◽  
Makoto Suyama ◽  
Tadayoshi Kawaguchi ◽  
...  
2020 ◽  
Vol 4 (5) ◽  
pp. 1-4
Author(s):  
Sina Ranjbar ◽  
Muftah Al-Mahdawi ◽  
Mikihiko Oogane ◽  
Yasuo Ando

2006 ◽  
Vol 304 (1) ◽  
pp. e297-e299
Author(s):  
D.C. Chen ◽  
Y.D. Yao ◽  
C.M. Chen ◽  
James Hung ◽  
Y.S. Chen ◽  
...  

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