Eliminating etch stop in high-density magnetic tunnel junction patterning using high-temperature CO/NH3 plasma etching
2019 ◽
Vol 37
(6)
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pp. 061808
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Keyword(s):
2020 ◽
Vol 38
(4)
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pp. 042805
2006 ◽
Vol 304
(1)
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pp. e297-e299
2012 ◽
Vol 51
(2)
◽
pp. 02BD01
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2007 ◽
Vol 40
(13)
◽
pp. 3951-3959
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Keyword(s):
2012 ◽
Vol 51
(2S)
◽
pp. 02BD01
◽