Atomic layer deposition of cobalt oxide on oxide substrates and low temperature reduction to form ultrathin cobalt metal films

2019 ◽  
Vol 37 (1) ◽  
pp. 010903 ◽  
Author(s):  
Zizhuo Zhang ◽  
Himamshu C. Nallan ◽  
Brennan M. Coffey ◽  
Thong Q. Ngo ◽  
Tanmoy Pramanik ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Cobalt Oxide ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Temperature Reduction ◽  
Layer Deposition ◽  
Oxide Substrates ◽  
Low Temperature Reduction

Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

2016 ◽  
Vol 28 (3) ◽  
pp. 700-703 ◽  
Author(s):  
Joseph P. Klesko ◽  
Marissa M. Kerrigan ◽  
Charles H. Winter
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Layer Deposition

Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid

2017 ◽  
Vol 146 (5) ◽  
pp. 052813 ◽  
Author(s):  
Marissa M. Kerrigan ◽  
Joseph P. Klesko ◽  
Sara M. Rupich ◽  
Charles L. Dezelah ◽  
Ravindra K. Kanjolia ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Formic Acid ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Substrate Selectivity ◽  
Tert Butyl ◽  
Layer Deposition

(Invited) Precursors for the Thermal Atomic Layer Deposition of Cobalt Metal Films and Alloys Thereof

2021 ◽  
Vol MA2021-01 (21) ◽  
pp. 836-836
Author(s):  
Charles H. Winter ◽  
Jonathan Hollin ◽  
Nyi Myat Khine Linn ◽  
Zachary Devereaux
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Layer Deposition

scholarly journals Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

2017 ◽  
Vol 29 (14) ◽  
pp. 5796-5805 ◽  
Author(s):  
Jiyeon Kim ◽  
Tomi Iivonen ◽  
Jani Hämäläinen ◽  
Marianna Kemell ◽  
Kristoffer Meinander ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Cobalt Oxide ◽  
Water Splitting ◽  
Atomic Layer ◽  
Photoelectrochemical Water Splitting ◽  
Effective Catalyst ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 907
Author(s):  
Yury Koshtyal ◽  
Ilya Mitrofanov ◽  
Denis Nazarov ◽  
Oleg Medvedev ◽  
Artem Kim ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Atomic Layer Deposition ◽  
Nickel Oxide ◽  
Cobalt Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Metallic Nickel ◽  
Uniform Density ◽  
Oxide Content ◽  
Layer Deposition

Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

Sign in / Sign up

Export Citation Format

Share Document