Low Temperature, Selective Atomic Layer Deposition of Cobalt Metal Films Using Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Alkylamine Precursors

Marissa M. Kerrigan; Joseph P. Klesko; Charles H. Winter

doi:10.1021/acs.chemmater.7b02456

Low Temperature, Selective Atomic Layer Deposition of Cobalt Metal Films Using Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Alkylamine Precursors

Chemistry of Materials ◽

10.1021/acs.chemmater.7b02456 ◽

2017 ◽

Vol 29 (17) ◽

pp. 7458-7466 ◽

Cited By ~ 22

Author(s):

Marissa M. Kerrigan ◽

Joseph P. Klesko ◽

Charles H. Winter

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Films ◽

Cobalt Metal ◽

Tert Butyl ◽

Layer Deposition

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Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid

The Journal of Chemical Physics ◽

10.1063/1.4968848 ◽

2017 ◽

Vol 146 (5) ◽

pp. 052813 ◽

Cited By ~ 18

Author(s):

Marissa M. Kerrigan ◽

Joseph P. Klesko ◽

Sara M. Rupich ◽

Charles L. Dezelah ◽

Ravindra K. Kanjolia ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Formic Acid ◽

Atomic Layer ◽

Metal Films ◽

Cobalt Metal ◽

Substrate Selectivity ◽

Tert Butyl ◽

Layer Deposition

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Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

Chemistry of Materials ◽

10.1021/acs.chemmater.5b03504 ◽

2016 ◽

Vol 28 (3) ◽

pp. 700-703 ◽

Cited By ~ 35

Author(s):

Joseph P. Klesko ◽

Marissa M. Kerrigan ◽

Charles H. Winter

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Films ◽

Cobalt Metal ◽

Layer Deposition

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Atomic layer deposition of cobalt oxide on oxide substrates and low temperature reduction to form ultrathin cobalt metal films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5063669 ◽

2019 ◽

Vol 37 (1) ◽

pp. 010903 ◽

Cited By ~ 5

Author(s):

Zizhuo Zhang ◽

Himamshu C. Nallan ◽

Brennan M. Coffey ◽

Thong Q. Ngo ◽

Tanmoy Pramanik ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Cobalt Oxide ◽

Atomic Layer ◽

Metal Films ◽

Cobalt Metal ◽

Temperature Reduction ◽

Layer Deposition ◽

Oxide Substrates ◽

Low Temperature Reduction

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(Invited) Precursors for the Thermal Atomic Layer Deposition of Cobalt Metal Films and Alloys Thereof

ECS Meeting Abstracts ◽

10.1149/ma2021-0121836mtgabs ◽

2021 ◽

Vol MA2021-01 (21) ◽

pp. 836-836

Author(s):

Charles H. Winter ◽

Jonathan Hollin ◽

Nyi Myat Khine Linn ◽

Zachary Devereaux

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Films ◽

Cobalt Metal ◽

Layer Deposition

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Low-Temperature IGZO Technology on Transparent Plastic Foil by Atmospheric Spatial Atomic Layer Deposition

Proceedings of the International Display Workshops ◽

10.36463/idw.2019.amd7-4l ◽

2019 ◽

pp. 489

Author(s):

Corné Frijters ◽

Roy Verbeek ◽

Gerard de Haas ◽

Tung Huei Ke ◽

Erwin Vandenplas ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Transparent Plastic ◽

Layer Deposition ◽

Plastic Foil

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Estimating the Interrelation between the Rate of Atomic Layer Deposition of Thin Platinum-Group Metal Films and the Molecular Mass of Reactant Precursors

Russian Microelectronics ◽

10.1134/s1063739719040103 ◽

2019 ◽

Vol 48 (4) ◽

pp. 208-219

Author(s):

V. Yu. Vasilyev

Keyword(s):

Atomic Layer Deposition ◽

Molecular Mass ◽

Atomic Layer ◽

Platinum Group Metal ◽

Metal Films ◽

Group Metal ◽

Layer Deposition ◽

Platinum Group ◽

Thin Platinum

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Low-temperature high-performance In-Ga-Sn-O thin-film transistors with Al2O3 grown by a facile dual-atomic layer deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2021.160053 ◽

2021 ◽

pp. 160053

Author(s):

Hyunjae Jang ◽

Changyong Oh ◽

Tae Hyun Kim ◽

Hyeong Wook Kim ◽

Sang Ik Lee ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Atomic Layer ◽

Layer Deposition

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Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition

Ceramics International ◽

10.1016/j.ceramint.2019.01.027 ◽

2019 ◽

Vol 45 (6) ◽

pp. 7407-7412 ◽

Cited By ~ 1

Author(s):

Ju-Hwan Han ◽

Su Ho Lim ◽

Jin-Myung Choi ◽

Seong-Hyeon Lee ◽

Woojin Jeon ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Multilayer Structure ◽

Atomic Layer ◽

Gas Diffusion ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Layer Deposition

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Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

Applied Surface Science ◽

10.1016/j.apsusc.2021.150152 ◽

2021 ◽

pp. 150152

Author(s):

Mohd Zahid Ansari ◽

Petr Janicek ◽

Dip K Nandi ◽

Stanislav Slang ◽

Marek Bouska ◽

...

Keyword(s):

Thin Films ◽

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Temperature Growth ◽

Low Temperature Growth ◽

Layer Deposition ◽

Divalent Tin

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Low temperature temporal and spatial atomic layer deposition of TiO2 films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4922588 ◽

2015 ◽

Vol 33 (4) ◽

pp. 041512 ◽

Cited By ~ 24

Author(s):

Morteza Aghaee ◽

Philipp S. Maydannik ◽

Petri Johansson ◽

Jurkka Kuusipalo ◽

Mariadriana Creatore ◽

...

Keyword(s):

Low Temperature ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Tio2 Films ◽

Layer Deposition ◽

Temporal And Spatial

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