Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid

2017 ◽  
Vol 146 (5) ◽  
pp. 052813 ◽  
Author(s):  
Marissa M. Kerrigan ◽  
Joseph P. Klesko ◽  
Sara M. Rupich ◽  
Charles L. Dezelah ◽  
Ravindra K. Kanjolia ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Formic Acid ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Substrate Selectivity ◽  
Tert Butyl ◽  
Layer Deposition

Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

2016 ◽  
Vol 28 (3) ◽  
pp. 700-703 ◽  
Author(s):  
Joseph P. Klesko ◽  
Marissa M. Kerrigan ◽  
Charles H. Winter
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Layer Deposition

(Invited) Precursors for the Thermal Atomic Layer Deposition of Cobalt Metal Films and Alloys Thereof

2021 ◽  
Vol MA2021-01 (21) ◽  
pp. 836-836
Author(s):  
Charles H. Winter ◽  
Jonathan Hollin ◽  
Nyi Myat Khine Linn ◽  
Zachary Devereaux
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Films ◽  
Cobalt Metal ◽  
Layer Deposition

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial
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