In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursors

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The schematic diagram of the processing cycle including the atomic layer annealing (ALA) to achieve low-temperature epitaxial growth of AlN on SiC.


2016 ◽  
Vol 108 (5) ◽  
pp. 052903 ◽  
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