In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursors
2018 ◽
Vol 36
(6)
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pp. 061503
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2014 ◽
Vol 32
(1)
◽
pp. 01A108
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2021 ◽
Vol 39
(2)
◽
pp. 022406
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2017 ◽
Vol 309
◽
pp. 600-608
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