Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
2014 ◽
Vol 32
(1)
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pp. 01A108
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2013 ◽
Vol 31
(1)
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pp. 01A124
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1997 ◽
Vol 112
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pp. 75-81
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2015 ◽
Vol 27
(17)
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pp. 5988-5996
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2018 ◽
Vol 36
(6)
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pp. 061503
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