Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition

2018 ◽  
Vol 36 (6) ◽  
pp. 06A104
Author(s):  
Shinya Iwashita ◽  
Tsuyoshi Moriya ◽  
Akira Uedono
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Titanium Silicon

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

2010 ◽  
Vol 157 (10) ◽  
pp. G193 ◽  
Author(s):  
Aile Tamm ◽  
Marianna Kemell ◽  
Jekaterina Kozlova ◽  
Timo Sajavaara ◽  
Massimo Tallarida ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Erbium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

Synthesis and characterization of PbTe thin films by atomic layer deposition

2014 ◽  
Vol 211 (6) ◽  
pp. 1329-1333 ◽  
Author(s):  
K. Zhang ◽  
A. D. Ramalingom Pillai ◽  
M. Tangirala ◽  
D. Nminibapiel ◽  
K. Bollenbach ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Layer Deposition

scholarly journals Characteristics of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using Alternating Exposures of SiH2Cl2and O3

2004 ◽  
Vol 14 (2) ◽  
pp. 90-93
Author(s):  
Won-Jun Lee ◽  
Joo-Hyeon Lee ◽  
Chang-Hee Han ◽  
Un-Jung Kim ◽  
Youn-Seung Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH2Cl2and O3

2010 ◽  
Vol 49 (7) ◽  
pp. 071504 ◽  
Author(s):  
Won-Jun Lee ◽  
Chang-Hee Han ◽  
Jae-Kyun Park ◽  
Youn-Seoung Lee ◽  
Sa-Kyun Rha
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Characterization of lanthanum lutetium oxide thin films grown by atomic layer deposition as an alternative gate dielectric

2008 ◽  
Vol 517 (1) ◽  
pp. 201-203 ◽  
Author(s):  
M. Roeckerath ◽  
T. Heeg ◽  
J.M.J. Lopes ◽  
J. Schubert ◽  
S. Mantl ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gate Dielectric ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Lutetium Oxide ◽  
Layer Deposition

Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH2Cl2and O3as the Precursors

2004 ◽  
Vol 43 (No. 3A) ◽  
pp. L328-L330 ◽  
Author(s):  
Joo-Hyeon Lee ◽  
Un-Jung Kim ◽  
Chang-Hee Han ◽  
Sa-Kyun Rha ◽  
Won-Jun Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Atomic layer deposition and characterization of vanadium oxide thin films

RSC Advances ◽  
2013 ◽  
Vol 3 (4) ◽  
pp. 1179-1185 ◽  
Author(s):  
Timothee Blanquart ◽  
Jaakko Niinistö ◽  
Marco Gavagnin ◽  
Valentino Longo ◽  
Mikko Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Vanadium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Vanadium Oxide Thin Films

Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

2013 ◽  
Vol 2 (12) ◽  
pp. P114-P116 ◽  
Author(s):  
J.-S. Choi ◽  
B. S. Yang ◽  
S.-J. Won ◽  
J. R. Kim ◽  
S. Suh ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
O2 Plasma
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