scholarly journals In situ transformation and cleaning of tin-drop contamination on mirrors for extreme ultraviolet light

2018 ◽  
Vol 36 (2) ◽  
pp. 021602 ◽  
Author(s):  
Norbert Böwering ◽  
Christian Meier
Keyword(s):  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Light

Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

2011 ◽  
Author(s):  
J. Sporre ◽  
R. E. Lofgren ◽  
D. N. Ruzic ◽  
O. V. Khodykin ◽  
D. W. Myers
Keyword(s):  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Cleaning Method ◽  
Extreme Ultraviolet Light

scholarly journals In Situ Sub-50-Attosecond Active Stabilization of the Delay Between Infrared and Extreme-Ultraviolet Light Pulses

2021 ◽  
Vol 15 (3) ◽  
Author(s):  
Martin Luttmann ◽  
David Bresteau ◽  
Jean-François Hergott ◽  
Olivier Tcherbakoff ◽  
Thierry Ruchon
Keyword(s):  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Light Pulses ◽  
Active Stabilization ◽  
Extreme Ultraviolet Light

Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer

2013 ◽  
Vol 52 (5R) ◽  
pp. 056701 ◽  
Author(s):  
Takeo Watanabe ◽  
Yukiko Kikuchi ◽  
Toshiya Takahashi ◽  
Kazuhiro Katayama ◽  
Isamu Takagi ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Ultraviolet Light ◽  
High Power ◽  
Extreme Ultraviolet ◽  
Thickness Measurement ◽  
Extreme Ultraviolet Light

Tailoring extreme-ultraviolet light

2017 ◽  
Vol 11 (4) ◽  
pp. 209-210
Author(s):  
Taro Sekikawa ◽  
Kenichi L. Ishikawa
Keyword(s):  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Light

Lasing of extreme ultraviolet light with nitrogen plasma in a recombining phase—Roles of doubly excited states

2012 ◽  
Vol 19 (6) ◽  
pp. 063302 ◽  
Author(s):  
Takuya Ozawa ◽  
Shuhei Yamamura ◽  
Nao Tatsumura ◽  
Kazuhiko Horioka ◽  
Tohru Kawamura
Keyword(s):  
Excited States ◽  
Ultraviolet Light ◽  
Extreme Ultraviolet ◽  
Nitrogen Plasma ◽  
Doubly Excited States ◽  
Doubly Excited ◽  
Extreme Ultraviolet Light

Enhancing the conversion efficiency of extreme ultraviolet light sources using a 2 µm-wavelength laser

2021 ◽  
Author(s):  
Yun Yuan ◽  
Yan-Yun Ma ◽  
Wenpeng Wang ◽  
Shijia Chen ◽  
Ye Cui ◽  
...  
Keyword(s):  
Energy Conversion ◽  
Emission Spectrum ◽  
Ultraviolet Light ◽  
Conversion Efficiency ◽  
Extreme Ultraviolet ◽  
Light Sources ◽  
Band Emission ◽  
Percentage Points ◽  
Hydrodynamic Code ◽  
Extreme Ultraviolet Light

Abstract In this study, we use the FLASH radiation hydrodynamic code and the FLYCHK atomic code to investigate the energy conversion and spectra associated with laser–Sn target interactions with 1 µm and 2 µm wavelength lasers. We found that the conversion efficiency (CE) reached as much as 3.38% with the 2 µm laser, which is 1.48 percentage points higher than the 1 µm laser (CE = 1.9%). In addition, we analyzed the contribution of dominant ionization states to the emission spectrum for both lasers. We observed that the growths of the out-of-band emission eventually led to a broadening of the spectrum, resulting in a reduction of SP for the 1 µm laser. By contrast, the emission main peaks were all centered near 13.5nm for the 2 µm laser, which is beneficial for efficient emission of light with a 13.5 nm wavelength (relevant for nanolithographic applications).

scholarly journals Observation of extreme ultraviolet light emission from an expanding plasma jet with multiply charged argon or xenon ions

2018 ◽  
Vol 113 (15) ◽  
pp. 153502 ◽  
Author(s):  
A. G. Shalashov ◽  
A. V. Vodopyanov ◽  
I. S. Abramov ◽  
A. V. Sidorov ◽  
E. D. Gospodchikov ◽  
...  
Keyword(s):  
Ultraviolet Light ◽  
Light Emission ◽  
Extreme Ultraviolet ◽  
Plasma Jet ◽  
Multiply Charged ◽  
Extreme Ultraviolet Light
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