Characterization of photoresist films exposed to high-dose implantation conditions

2018 ◽  
Vol 36 (1) ◽  
pp. 011201 ◽  
Author(s):  
Marion Croisy ◽  
Erwine Pargon ◽  
Cécile Jenny ◽  
Claire Richard ◽  
Denis Guiheux ◽  
...  
Keyword(s):  
High Dose ◽  
High Dose Implantation

Mesotaxy: Formation of Buried Single-Crystal CoSi2 Layers by Implantation

1986 ◽  
Vol 74 ◽  
Author(s):  
Alice E. White ◽  
K. T. Short ◽  
R. C. Dynes ◽  
J. P. Garno ◽  
J. M. Gibson
Keyword(s):  
High Temperature ◽  
Single Crystal ◽  
Electrical Characterization ◽  
Rutherford Backscattering ◽  
High Dose ◽  
High Temperature Annealing ◽  
Buried Layers ◽  
High Dose Implantation ◽  
Better Than

AbstractUsing high dose implantation of 200 keV Co ions followed by high temperature annealing, we have created buried layers of CoSi2 in crystalline Si of both (100) and (111) orientations. For a dose of 3 × 1017 Co/cm2, the layer that forms is ∼1100Å thick and the overlying Si is ∼600Å thick. A lower dose of 2 × 1017 Co/cm2 yields a thinner layer, 700Å thick, under 1200Å of crystalline Si. Rutherford Backscattering and channeling analysis of the layers shows that they are aligned with the substrate (χmin of the Co as low as 6.4%.) and TEM inspection of the (100) CoSi2/Si interfaces shows that they are abrupt and epitaxial (with occasional small facets). Moreover, electrical characterization of these layers yields resistance ratios that are better than epitaxial CoSi2 films grown by more conventional UHV methods.

Clinical Characterization of High-Dose Gamma-Hydroxybutyric Acid (GHB) Intoxication

2006 ◽  
Author(s):  
Matthew W. Johnson ◽  
Lawrence P. Carter ◽  
Annie Umbricht ◽  
Roland R. Griffiths
Keyword(s):  
High Dose ◽  
Hydroxybutyric Acid

Pulsed Electron Beam Annealing of GaAs after High Dose Implantation of Hydrogen

1997 ◽  
Vol 248-249 ◽  
pp. 253-256 ◽  
Author(s):  
T. Hauser ◽  
L. Bredell ◽  
H. Gaigher ◽  
H. Alberts ◽  
A. Botha ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Dose ◽  
Pulsed Electron Beam ◽  
High Dose Implantation

Silicon on Insulator by High Dose Implantation

1984 ◽  
Vol 33 ◽  
Author(s):  
P. L. F. Hemment
Keyword(s):  
Physical Properties ◽  
Thermal Processing ◽  
Vlsi Circuits ◽  
Silicon On Insulator ◽  
High Dose ◽  
High Current ◽  
Processing Technologies ◽  
Oxygen Ions ◽  
High Doses ◽  
High Dose Implantation

ABSTRACTSilicon on insulator structures consisting of a buried dielectric, formed by the implantation of high doses of oxygen ions, have been shown to be suitable substrates for LSI circuits. The substrates are compatible with present silicon processing technologies and are confidently expected to be suitable for VLSI circuits. In this paper the microstructure and physical properties of this SOI material will be described and the dependence of these characteristics upon the implantation conditions and subsequent thermal processing will be discussed. With this information, it is then possible to outline the specification for a high current oxygen implanter.

High Dose Implantation of Au and Cu into Si Studied by Auger Electron and Backscattering Spectroscopies

1977 ◽  
pp. 57-64
Author(s):  
A. Hiraki ◽  
M. Iwami ◽  
K. Shuto ◽  
T. Saegusa ◽  
T. Narusawa ◽  
...  
Keyword(s):  
Auger Electron ◽  
High Dose ◽  
High Dose Implantation

scholarly journals Characterization of fluoroquinolone-induced Achilles tendon toxicity in rats: comparison of toxicities of 10 fluoroquinolones and effects of anti-inflammatory compounds.

1997 ◽  
Vol 41 (11) ◽  
pp. 2389-2393 ◽  
Author(s):  
Y Kashida ◽  
M Kato
Keyword(s):  
Nitric Oxide ◽  
Body Weight ◽  
Methyl Ester ◽  
Achilles Tendon ◽  
Antibacterial Agents ◽  
Antimicrobial Agents ◽  
High Dose ◽  
Juvenile Rats ◽  
Anti Inflammatory

Fluoroquinolone antibacterial agents have been reported to induce tendon lesions in juvenile rats. In the present study, we characterized fluoroquinolone-induced Achilles tendon lesions by comparing the effects of 10 fluoroquinolones and examining the potential of one of these antimicrobial agents, pefloxacin, to induce tendon lesions when coadministered with one of nine anti-inflammatory compounds. Among the 10 fluoroquinolones tested, fleroxacin and pefloxacin were the most toxic, inducing lesions at a dose of 100 mg/kg of body weight or more, while lomefloxacin, levofloxacin, and ofloxacin or sparfloxacin and enoxacin induced lesions at 300 mg/kg or more and 900 mg/kg, respectively. In contrast, norfloxacin, ciprofloxacin, and tosufloxacin had no effect even at the high dose of 900 mg/kg. The severity of the Achilles tendon lesions appeared to correlate with the structure of the substituent at the seventh position. Furthermore, pefloxacin-induced tendon lesions were inhibited by coadministration with dexamethasone and N-nitro-L-arginine methyl ester. Phenidone (1-phenyl-3-pyrazolidinone) and 2-(12-hydroxydodeca-5,10-diynyl)3,5,6-trimethyl-1,4-benzoqui none (AA861) also decreased the incidence of tendon lesions. In contrast, catalase, dimethyl sulfoxide, indomethacin, pyrilamine, and cimetidine did not modify these tendon lesions. These results suggest that nitric oxide and 5-lipoxigenase products partly mediate fluoroquinolone-induced tendon lesions.

An Electrical and Physical Study of Crystal Damage in High-Dose Al- and N-Implanted 4H-SiC

2017 ◽  
Vol 897 ◽  
pp. 411-414 ◽  
Author(s):  
Craig A. Fisher ◽  
Romain Esteve ◽  
Stefan Doering ◽  
Michael Roesner ◽  
Martin de Biasio ◽  
...  
Keyword(s):  
High Temperature ◽  
Room Temperature ◽  
High Dose ◽  
Stress Determination ◽  
Analysis Techniques ◽  
Physical Study ◽  
Crystal Damage ◽  
Activation Annealing ◽  
Anneal Temperature ◽  
High Dose Implantation

In this paper, an investigation into the crystal structure of Al-and N-implanted 4H-SiC is presented, encompassing a range of physical and electrical analysis techniques, with the aim of better understanding the material properties after high-dose implantation and activation annealing. Scanning spreading resistance microscopy showed that the use of high temperature implantation yields more uniform resistivity profiles in the implanted layer; this correlates with KOH defect decoration and TEM observations, which show that the crystal damage is much more severe in room temperature implanted samples, regardless of anneal temperature. Finally, stress determination by means of μRaman spectroscopy showed that the high temperature implantation results in lower tensile stress in the implanted layers with respect to the room temperature implantation samples.

Characterization of microMOSFET detectors for in vivo dosimetry in high‐dose‐rate brachytherapy with 192 Ir

2020 ◽  
Vol 47 (5) ◽  
pp. 2242-2253 ◽  
Author(s):  
Samuel Ruiz‐Arrebola ◽  
Rosa Fabregat‐Borrás ◽  
Eduardo Rodríguez ◽  
Manuel Fernández‐Montes ◽  
Mercedes Pérez‐Macho ◽  
...  
Keyword(s):  
Dose Rate ◽  
High Dose Rate ◽  
In Vivo Dosimetry ◽  
High Dose ◽  
High Dose Rate Brachytherapy

scholarly journals Development of High Dose Oseltamivir Phosphate Dry Powder for Inhalation Therapy in Viral Pneumonia

Pharmaceutics ◽  
2020 ◽  
Vol 12 (12) ◽  
pp. 1154
Author(s):  
Shahir Aziz ◽  
Regina Scherlieβ ◽  
Hartwig Steckel
Keyword(s):  
Virus Disease ◽  
Antiviral Drug ◽  
Physicochemical Characterization ◽  
Inhalation Therapy ◽  
High Dose ◽  
Dry Powder ◽  
Medium Resistance ◽  
High Doses ◽  
Oseltamivir Phosphate

Oseltamivir phosphate (OP) is an antiviral drug available only as oral therapy for the treatment of influenza and as a potential treatment option when in combination with other medication in the fight against the corona virus disease (COVID-19) pneumonia. In this study, OP was formulated as a dry powder for inhalation, which allows drug targeting to the site of action and potentially reduces the dose, aiming a more efficient therapy. Binary formulations were based on micronized excipient particles acting like diluents, which were blended with the drug OP. Different excipient types, excipient ratios, and excipient size distributions were prepared and examined. To investigate the feasibility of delivering high doses of OP in a single dose, 1:1, 1:3, and 3:1 drug/diluent blending ratios have been prepared. Subsequently, the aerosolization performance was evaluated for all prepared formulations by cascade impaction using a novel medium-resistance capsule-based inhaler (UNI-Haler). Formulations with micronized trehalose showed relatively excellent aerosolization performance with highest fine-particle doses in comparison to examined lactose, mannitol, and glucose under similar conditions. Focusing on the trehalose-based dry-powder inhalers’ (DPIs) formulations, a physicochemical characterization of extra micronized grade trehalose in relation to the achieved performance in dispersing OP was performed. Additionally, an early indication of inhaled OP safety on lung cells was noted by the viability MTT assay utilizing Calu-3 cells.

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