Frequency dispersion and dielectric relaxation in postdeposition annealed high-κ erbium oxide metal–oxide–semiconductor capacitors
2018 ◽
Vol 36
(1)
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pp. 012201
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2017 ◽
Vol 178
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pp. 182-185
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1981 ◽
Vol 24
(6)
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pp. 569-576
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2020 ◽
Vol 16
(2)
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pp. 140-145
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2017 ◽
Vol 178
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pp. 204-208
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