Stress modulation of titanium nitride thin films deposited using atomic layer deposition

2017 ◽  
Vol 35 (1) ◽  
pp. 01B144 ◽  
Author(s):  
Manuj Nahar ◽  
Noel Rocklein ◽  
Michael Andreas ◽  
Greg Funston ◽  
Duane Goodner
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition of Titanium Nitride Thin Films Using tert-Butylamine and Allylamine as Reductive Nitrogen Sources

2002 ◽  
Vol 5 (1) ◽  
pp. C4 ◽  
Author(s):  
Marika Juppo ◽  
Petra Alén ◽  
Mikko Ritala ◽  
Timo Sajavaara ◽  
Juhani Keinonen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Nitrogen Sources ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Tert Butylamine

Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition

2017 ◽  
Vol 30 (9) ◽  
pp. 095010 ◽  
Author(s):  
Y T Yemane ◽  
M J Sowa ◽  
J Zhang ◽  
L Ju ◽  
E W Deguns ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Niobium Titanium

scholarly journals Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride

2019 ◽  
Vol 9 (12) ◽  
pp. 4556
Author(s):  
Sasha Woodward-Gagné ◽  
Nicolas Desjardins-Lecavalier ◽  
Bill Baloukas ◽  
Oleg Zabeida ◽  
Ludvik Martinu
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Angular Selectivity

Low-temperature (≤200 °C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

2013 ◽  
Vol 31 (1) ◽  
pp. 01A137 ◽  
Author(s):  
Nigamananda Samal ◽  
Hui Du ◽  
Russell Luberoff ◽  
Krishna Chetry ◽  
Randhir Bubber ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Dense Titanium

scholarly journals Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 015218
Author(s):  
Changbong Yeon ◽  
Jaesun Jung ◽  
Hyeran Byun ◽  
Kok Chew Tan ◽  
Taeho Song ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Alkyl Halides ◽  
Layer Deposition ◽  
Tertiary Alkyl

Depositing High-Performance Conductive Thin Films by Using Atomic Layer Deposition

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
High Performance ◽  
Atomic Layer ◽  
Electric Properties ◽  
X Ray Diffraction ◽  
Layer Deposition ◽  
Azo Thin Film ◽  
Aluminum Doped Zinc Oxide ◽  
Conductive Thin Films

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.

scholarly journals Fabrication of GdxFeyOz films using an atomic layer deposition-type approach

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Complex Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Atomic Precision

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.

Inherently Area‐Selective Atomic Layer Deposition of SiO 2 Thin Films to Confer Oxide Versus Nitride Selectivity

2021 ◽  
pp. 2102556
Author(s):  
Jinseon Lee ◽  
Jeong‐Min Lee ◽  
Hongjun Oh ◽  
Changhan Kim ◽  
Jiseong Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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