Proposed architecture of a multicolumn electron-beam wafer inspection system for high-volume manufacturing

2015 ◽  
Vol 33 (6) ◽  
pp. 06FN01 ◽  
Author(s):  
Dan Meisburger ◽  
James Spallas ◽  
Kurt Werder ◽  
Lawrence Muray
Keyword(s):  
Electron Beam ◽  
High Volume ◽  
Inspection System ◽  
Wafer Inspection

Characterization of a new automated electron beam wafer inspection system

1995 ◽  
Author(s):  
Douglas Hendricks ◽  
Jack Y. Jau ◽  
Hans Dohse ◽  
Alan D. Brodie ◽  
William D. Meisburger
Keyword(s):  
Electron Beam ◽  
Inspection System ◽  
Wafer Inspection

Application of the SEMSpec electron-beam inspection system to in-process defect detection on semiconductor wafers

1996 ◽  
Vol 30 (1-4) ◽  
pp. 567-570 ◽  
Author(s):  
T.R. Cass ◽  
D. Hendricks ◽  
J. Jau ◽  
H.J. Dohse ◽  
A.D. Brodie ◽  
...  
Keyword(s):  
Electron Beam ◽  
Defect Detection ◽  
Inspection System

EPL stencil mask defect inspection system using transmission electron beam

2003 ◽  
Author(s):  
Jiro Yamamoto ◽  
Teruo Iwasaki ◽  
Masaki Yamabe ◽  
Norimichi Anazawa ◽  
Satoru Maruyama ◽  
...  
Keyword(s):  
Electron Beam ◽  
Inspection System ◽  
Defect Inspection ◽  
Transmission Electron ◽  
Stencil Mask

Development of Cathode Filament Power Supply for EBW Based on ARM

2014 ◽  
Vol 960-961 ◽  
pp. 1300-1303
Author(s):  
Ze Ting Wang ◽  
Peng Liu ◽  
Sheng Wen Fan
Keyword(s):  
Electron Beam ◽  
Power Supply ◽  
Electron Beam Welding ◽  
High Volume ◽  
High Energy ◽  
High Energy Density ◽  
Shipping Industry ◽  
Soft Start ◽  
Power Frequency ◽  
Low Efficiency

The electron beam welding has high energy density, and has been widely applied in air space, the car and shipping industry. Traditional electron beam welding machine power supply system adopts the technology of the power frequency or medium frequency, with high volume, low efficiency and poor stability of electron beam. I put forward a digital filament power control scheme based on STM32, and introduce the hardware and software implementation method in detail. Experiments show that it can realize soft-start and soft-down process, and also be quickly identified and promptly forbid the output when filament fracture, which realize the intellectualization of filament power supply.

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

2012 ◽  
Author(s):  
Jun-ichi Kon ◽  
Takashi Maruyama ◽  
Yoshinori Kojima ◽  
Yasushi Takahashi ◽  
Shinji Sugatani ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Volume ◽  
Direct Writing ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Etch process monitoring by electron beam wafer inspection

2007 ◽  
Author(s):  
Luke Lin ◽  
Jia-Yun Chen ◽  
Wen-Yi Wong ◽  
Mark McCord ◽  
Alex Tsai ◽  
...  
Keyword(s):  
Electron Beam ◽  
Process Monitoring ◽  
Wafer Inspection

Detecting Defects in Cu Metallization Structures by Electron-Beam Wafer Inspection

2004 ◽  
Vol 151 (6) ◽  
pp. G440 ◽  
Author(s):  
Miyako Matsui ◽  
Cheng Zhaohui ◽  
Mari Nozoe ◽  
Katsuhiro Torii
Keyword(s):  
Electron Beam ◽  
Cu Metallization ◽  
Wafer Inspection

Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system

2011 ◽  
Author(s):  
Takeya Shimomura ◽  
Satoshi Kawashima ◽  
Yuichi Inazuki ◽  
Tsukasa Abe ◽  
Tadahiko Takikawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Contact Layer ◽  
Inspection System ◽  
Nand Flash
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