Erratum: “Effect of process parameters on properties of argon–nitrogen plasma for titanium nitride film deposition” [J. Vac. Sci. Technol. A 31, 061307 (2013)]

2014 ◽  
Vol 32 (4) ◽  
pp. 043401 ◽  
Author(s):  
Partha Saikia ◽  
Bharat Kakati
Keyword(s):  
Titanium Nitride ◽  
Process Parameters ◽  
Nitrogen Plasma ◽  
Film Deposition ◽  
Nitride Film ◽  
Titanium Nitride Film

scholarly journals Titanium Nitride Film Prepared by DC Titanium-Arc Plasma-Based Ion Implantation in Nitrogen.

1999 ◽  
Vol 75 (4) ◽  
pp. 426-431
Author(s):  
Masanori SANO ◽  
Ken YUKIMURA ◽  
Toshiro MARUYAMA ◽  
Shunji KUROOKA ◽  
Yasuo SUZUKI ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Titanium Nitride ◽  
Nitride Film ◽  
Arc Plasma ◽  
Titanium Nitride Film

Resistive Width of Superconducting Transition in Titanium Nitride Thin Film

2011 ◽  
Vol 6 (2) ◽  
pp. 50-56
Author(s):  
Svetlana V. Postolova ◽  
Alexey Yu. Mironov ◽  
Tatyana I. Baturina
Keyword(s):  
Transition Temperature ◽  
Titanium Nitride ◽  
Electron Interaction ◽  
Nitride Film ◽  
Superconducting Transition ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Superconducting Fluctuations ◽  
Width Of Superconducting Transition ◽  
Titanium Nitride Film

The transition to the superconducting state of the ultrathin (5 nm thick) titanium nitride film was studied. It is found that the nonmonotonic temperature dependence of the resistance, R(T), is a consequence of competition between the contributions to conductivity from quantum corrections stemming from the electron-electron interaction in the diffusion and Cooper channels. It is shown that the appreciable decrease in the resistance at T > Tc (Tc is the superconducting transition temperature) results from the superconducting fluctuations. We present the results of the analysis of low-temperature (T < Tc ) current-voltage characteristics V(I). It is found that they follow the power-law behavior V∝ I α(T) , with α(T) increasing rapidly with the decreasing temperature. The Berezinskii-Kosterlitz-Thouless transition temperature, TBKT, and width of the superconducting transition ∆T = Tc − TБКТ were determined

Plasma-dynamic and optical characteristics of magnetron-type cylindrical gas discharge under conditions of titanium nitride film synthesis

2009 ◽  
Vol 54 (7) ◽  
pp. 1052-1057 ◽  
Author(s):  
I. V. Blonskii ◽  
A. A. Goncharov ◽  
A. V. Demchishin ◽  
A. N. Evsyukov ◽  
E. G. Kostin ◽  
...  
Keyword(s):  
Titanium Nitride ◽  
Gas Discharge ◽  
Optical Characteristics ◽  
Nitride Film ◽  
Plasma Dynamic ◽  
Film Synthesis ◽  
Titanium Nitride Film

Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering

2011 ◽  
Vol 204-210 ◽  
pp. 1685-1690 ◽  
Author(s):  
Yu Qiang Chen ◽  
Fu Yi Gao ◽  
Hong Yan Peng ◽  
Hong Wei Jiang ◽  
Long Cheng Yin ◽  
...  
Keyword(s):  
Corrosion Resistance ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Nitride Film ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
Atomic Force ◽  
Tin Film ◽  
Titanium Nitride Film

A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.

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