Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor

2014 ◽  
Vol 32 (3) ◽  
pp. 031511 ◽  
Author(s):  
Ki-Moon Jeon ◽  
Jae-Su Shin ◽  
Ju-Young Yun ◽  
Sang Jun Lee ◽  
Sang-Woo Kang
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Silicon Dioxide Films ◽  
Layer Deposition

Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor

2018 ◽  
Vol 660 ◽  
pp. 572-577 ◽  
Author(s):  
Donghyuk Shin ◽  
Heungseop Song ◽  
Minhyeong Lee ◽  
Heungsoo Park ◽  
Dae-Hong Ko
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Silicon Dioxide Films ◽  
Layer Deposition

Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition

2019 ◽  
Vol 53 (1) ◽  
pp. 015204
Author(s):  
Hua-Hsuan Chen ◽  
Susumu Toko ◽  
Daisuke Ohori ◽  
Takuya Ozaki ◽  
Mitsuya Utsuno ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Neutral Beam ◽  
High Quality ◽  
Silicon Dioxide Films ◽  
Layer Deposition

scholarly journals Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

2010 ◽  
Vol 107 (6) ◽  
pp. 064314 ◽  
Author(s):  
D. Hiller ◽  
R. Zierold ◽  
J. Bachmann ◽  
M. Alexe ◽  
Y. Yang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Material Properties ◽  
Atomic Layer ◽  
Layer Deposition

A novel approach for fabrication of bismuth-silicon dioxide core-shell structures by atomic layer deposition

2009 ◽  
Vol 19 (38) ◽  
pp. 7050 ◽  
Author(s):  
Jongmin Lee ◽  
Shadyar Farhangfar ◽  
Renbin Yang ◽  
Roland Scholz ◽  
Marin Alexe ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Shell Structures ◽  
Core Shell ◽  
Novel Approach ◽  
Layer Deposition

Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone

2016 ◽  
Vol 120 (20) ◽  
pp. 10927-10935 ◽  
Author(s):  
Luis Fabián Peña ◽  
Charith E. Nanayakkara ◽  
Anupama Mallikarjunan ◽  
Haripin Chandra ◽  
Manchao Xiao ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Layer Deposition
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