Self-forming Al oxide barrier for nanoscale Cu interconnects created by hybrid atomic layer deposition of Cu–Al alloy

2014 ◽  
Vol 32 (1) ◽  
pp. 01A131 ◽  
Author(s):  
Jae-Hyung Park ◽  
Dong-Suk Han ◽  
You-Jin Kang ◽  
So-Ra Shin ◽  
Jong-Wan Park
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Al Alloy ◽  
Cu Interconnects ◽  
Layer Deposition ◽  
Oxide Barrier ◽  
Al Oxide

Ultrathin Al Oxide Seed Layer for Atomic Layer Deposition of High-κ Al2O3 Dielectrics on Graphene

2020 ◽  
Vol 37 (7) ◽  
pp. 076801
Author(s):  
Hang Yang ◽  
Wei Chen ◽  
Ming-Yang Li ◽  
Feng Xiong ◽  
Guang Wang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al Oxide

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects

2021 ◽  
Author(s):  
Yohei Kotsugi ◽  
Seung-Min Han ◽  
Youn-Hye Kim ◽  
Taehoon Cheon ◽  
Dip K. Nandi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Cu Interconnects ◽  
Layer Deposition

Tuning Acid–Base Properties Using Mg–Al Oxide Atomic Layer Deposition

2015 ◽  
Vol 7 (30) ◽  
pp. 16573-16580 ◽  
Author(s):  
David H. K. Jackson ◽  
Brandon J. O’Neill ◽  
Jechan Lee ◽  
George W. Huber ◽  
James A. Dumesic ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Acid Base ◽  
Layer Deposition ◽  
Al Oxide ◽  
Base Properties
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