Inductively coupled plasma–reactive ion etching of c- and a-plane AlGaN over the entire Al composition range: Effect of BCl3 pretreatment in Cl2/Ar plasma chemistry
2013 ◽
Vol 31
(6)
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pp. 061305
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2017 ◽
Vol 35
(4)
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pp. 041301
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2008 ◽
Vol 14
(3)
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pp. 297-302
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2009 ◽
Vol 27
(4)
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pp. 681-685
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2010 ◽
Vol 28
(4)
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pp. 745-749
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2004 ◽
Vol 43
(1)
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pp. 82-85
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