Inductively coupled plasma-reactive ion etching of InSb using CH4∕H2∕Ar plasma

2009 ◽  
Vol 27 (4) ◽  
pp. 681-685 ◽  
Author(s):  
Guo-Dong Zhang ◽  
Wei-Guo Sun ◽  
Shu-Li Xu ◽  
Hong-Yan Zhao ◽  
Hong-Yi Su ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma

Vacuum ◽  
2020 ◽  
Vol 181 ◽  
pp. 109421
Author(s):  
Moon Hwan Cha ◽  
Eun Taek Lim ◽  
Sung Yong Park ◽  
Ji Su Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma

2008 ◽  
Vol 14 (3) ◽  
pp. 297-302 ◽  
Author(s):  
Su Ryun Min ◽  
Han Na Cho ◽  
Yue Long Li ◽  
Sung Keun Lim ◽  
Seung Pil Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma

2008 ◽  
Vol 516 (11) ◽  
pp. 3521-3529 ◽  
Author(s):  
Su Ryun Min ◽  
Han Na Cho ◽  
Yue Long Li ◽  
Chee Won Chung
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Zno Films ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Fabrication of GaN-based LEDs with 22° undercut sidewalls by inductively coupled plasma reactive ion etching

2013 ◽  
Vol 22 (10) ◽  
pp. 106802
Author(s):  
Bo Wang ◽  
Shi-Chen Su ◽  
Miao He ◽  
Hong Chen ◽  
Wen-Bo Wu ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

scholarly journals Inductively Coupled Plasma Reactive Ion Etching of AlGaAsSb and InGaAsSb for Quaternary Antimonide MIM Thermophotovoltaics

2002 ◽  
Author(s):  
M. N. Palmisiano ◽  
G. M. Peake ◽  
R. J. Shul ◽  
C. I. Ashby ◽  
J. G. Cederberg ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Effect of the process parameters of inductively coupled plasma reactive ion etching on the fabrication of diamond nanotips

2014 ◽  
Vol 211 (10) ◽  
pp. 2343-2346 ◽  
Author(s):  
Hasan-al Mehedi ◽  
Vianney Mille ◽  
Jocelyn Achard ◽  
Ovidiu Brinza ◽  
Alix Gicquel
Keyword(s):  
Process Parameters ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled
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