Inductively coupled plasma reactive-ion etching of β-Ga2O3: Comprehensive investigation of plasma chemistry and temperature
2017 ◽
Vol 35
(4)
◽
pp. 041301
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2013 ◽
Vol 31
(6)
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pp. 061305
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Keyword(s):
2004 ◽
Vol 43
(1)
◽
pp. 82-85
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2014 ◽
Vol 211
(10)
◽
pp. 2343-2346
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Keyword(s):
Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma
1998 ◽
Vol 16
(4)
◽
pp. 1894
◽
Keyword(s):
Keyword(s):
2002 ◽
Vol 41
(Part 2, No. 8B)
◽
pp. L910-L912
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Keyword(s):