Charge trapping analysis of Al2O3 films deposited by atomic layer deposition using H2O or O3 as oxidant

2013 ◽  
Vol 31 (1) ◽  
pp. 01A101 ◽  
Author(s):  
Mireia Bargalló González ◽  
Joan Marc Rafí ◽  
Oihane Beldarrain ◽  
Miguel Zabala ◽  
Francesca Campabadal
Keyword(s):  
Atomic Layer Deposition ◽  
Charge Trapping ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films

scholarly journals Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC

AIP Advances ◽  
2016 ◽  
Vol 6 (7) ◽  
pp. 075021 ◽  
Author(s):  
Emanuela Schilirò ◽  
Raffaella Lo Nigro ◽  
Patrick Fiorenza ◽  
Fabrizio Roccaforte
Keyword(s):  
Atomic Layer Deposition ◽  
Negative Charge ◽  
Charge Trapping ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films ◽  
Trapping Effects

Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition

1997 ◽  
Vol 71 (25) ◽  
pp. 3604-3606 ◽  
Author(s):  
Y. Kim ◽  
S. M. Lee ◽  
C. S. Park ◽  
S. I. Lee ◽  
M. Y. Lee
Keyword(s):  
Optical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Substrate Dependence ◽  
Al2o3 Films

scholarly journals Electron transport mechanism through ultrathin Al2O3 films grown at low temperatures using atomic–layer deposition

2019 ◽  
Vol 34 (10) ◽  
pp. 105004
Author(s):  
Pengfei Ma ◽  
Wenhao Guo ◽  
Jiamin Sun ◽  
Jiacheng Gao ◽  
Guanqun Zhang ◽  
...  
Keyword(s):  
Electron Transport ◽  
Atomic Layer Deposition ◽  
Low Temperatures ◽  
Transport Mechanism ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films
Sign in / Sign up

Export Citation Format

Share Document