On the scaling of rf and dc self-bias voltages with pressure in electronegative capacitively coupled plasmas

2012 ◽  
Vol 30 (2) ◽  
pp. 021303 ◽  
Author(s):  
Ankur Agarwal ◽  
Leonid Dorf ◽  
Shahid Rauf ◽  
Ken Collins
Keyword(s):  
Capacitively Coupled ◽  
Self Bias ◽  
Coupled Plasmas

scholarly journals Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas

Materials ◽  
2021 ◽  
Vol 14 (17) ◽  
pp. 5036
Author(s):  
Chulhee Cho ◽  
Kwangho You ◽  
Sijun Kim ◽  
Youngseok Lee ◽  
Jangjae Lee ◽  
...  
Keyword(s):  
Peak Power ◽  
Pulsed Plasma ◽  
Capacitively Coupled ◽  
Plasma Diagnosis ◽  
Self Bias ◽  
Coupled Plasmas ◽  
Off Time ◽  
Insight Into ◽  
Sio2 Etching

Although pulse-modulated plasma has overcome various problems encountered during the development of the high aspect ratio contact hole etching process, there is still a lack of understanding in terms of precisely how the pulse-modulated plasma solves the issues. In this research, to gain insight into previously observed phenomena, SiO2 etching characteristics were investigated under various pulsed plasma conditions and analyzed through plasma diagnostics. Specifically, the disappearance of micro-trenching from the use of pulse-modulated plasma is analyzed via self-bias, and the phenomenon that as power off-time increases, the sidewall angle increases is interpreted via radical species density and self-bias. Further, the change from etching to deposition with decreased peak power during processing is understood via self-bias and electron density. It is expected that this research will provide an informative window for the optimization of SiO2 etching and for basic processing databases including plasma diagnosis for advanced plasma processing simulators.

scholarly journals Self-bias voltage formation and charged particle dynamics in multi-frequency capacitively coupled plasmas

AIP Advances ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 075024
Author(s):  
R. U. Masheyeva ◽  
K. N. Dzhumagulova ◽  
M. Myrzaly ◽  
J. Schulze ◽  
Z. Donkó
Keyword(s):  
Charged Particle ◽  
Bias Voltage ◽  
Particle Dynamics ◽  
Capacitively Coupled ◽  
Self Bias ◽  
Coupled Plasmas

Estimation of Ion Impact Energies and Electrode Self-Bias Voltage in Capacitive RF Discharges

1987 ◽  
Vol 98 ◽  
Author(s):  
S. E. Savas
Keyword(s):  
Bias Voltage ◽  
Capacitively Coupled ◽  
Ion Flow ◽  
Rf Discharges ◽  
Self Bias ◽  
Ion Energies ◽  
Bias Ratio ◽  
Ionization Model ◽  
Ion Impact ◽  
Impact Energies

ABSTRACTThe dependences of the electrode self-bias voltage and the ratio of ion energies on electrode area ratio are calculated for a model of capacitively coupled rf discharges. It is assumed that concentric spherical elecrodes with fluid-like radial ion flow adequately models the ion motion, that sheath impedances are dominant, and that ionization processes in the glow are due to ohmically heated electrons. Results show that the ratio of ion energies impacting the smaller electrode to those on the larger depends on the ratio of electrode areas in a more complex manner than a power law.The reason for this is that sheath impedances are more resistive or capacitive at different times in the rf cycle. The self-bias ratio is found to depend relatively little on the ionization model or the pressure but differs substantially from the “power law” result. The agreement of measurements with the model is fairly good.

An overview of diagnostic methods of low-pressure capacitively coupled plasmas

2012 ◽  
Vol 521 ◽  
pp. 141-145 ◽  
Author(s):  
Yong-Xin Liu ◽  
Wei Jiang ◽  
Xiao-Song Li ◽  
Wen-Qi Lu ◽  
You-Nian Wang
Keyword(s):  
Low Pressure ◽  
Diagnostic Methods ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Impact of phase lag on uniformity in pulsed capacitively coupled plasmas

2011 ◽  
Vol 99 (2) ◽  
pp. 021501 ◽  
Author(s):  
Ankur Agarwal ◽  
Shahid Rauf ◽  
Ken Collins
Keyword(s):  
Phase Lag ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Effects of magnetic field on the secondary electron asymmetry effect in capacitively coupled plasmas

2021 ◽  
Vol 28 (12) ◽  
pp. 123505
Author(s):  
Shali Yang ◽  
Tianxiang Zhang ◽  
Hanlei Lin ◽  
Hao Wu ◽  
Qiang Zhang
Keyword(s):  
Magnetic Field ◽  
Secondary Electron ◽  
Asymmetry Effect ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Resonant sheath heating in weakly magnetized capacitively coupled plasmas due to electron-cyclotron motion

2021 ◽  
Vol 104 (4) ◽  
Author(s):  
Quan-Zhi Zhang ◽  
Jing-Yu Sun ◽  
Wen-Qi Lu ◽  
Julian Schulze ◽  
Yu-Qing Guo ◽  
...  
Keyword(s):  
Electron Cyclotron ◽  
Cyclotron Motion ◽  
Capacitively Coupled ◽  
Coupled Plasmas
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