Charging effects during focused electron beam induced deposition of silicon oxide

2011 ◽  
Vol 29 (6) ◽  
pp. 06FD01 ◽  
Author(s):  
Sanne K. de Boer ◽  
Willem F. van Dorp ◽  
Jeff Th. M. De Hosson
Keyword(s):  
Electron Beam ◽  
Silicon Oxide ◽  
Electron Beam Induced Deposition

Cathodoluminescence of SiO2/Si System

2009 ◽  
Vol 156-158 ◽  
pp. 487-492 ◽  
Author(s):  
M.V. Zamoryanskaya
Keyword(s):  
Activation Energy ◽  
Electron Beam ◽  
Rise Time ◽  
Silicon Oxide ◽  
Beam Current ◽  
Electron Beam Current ◽  
Electron Traps ◽  
Definition Of ◽  
Luminescent Centers

In this paper the new method for determination of luminescent centers concentration are discussed. While the possibility of electron traps determination and definition of its activation energy are suggested. The cathodoluminescent (CL) method was used. The determination of luminescent centers concentration in silicon oxide is based on the measurements of dependences of CL intensity on electron beam current. The presence and energy of activation of electron traps were studied by measurement of rise time and decay of luminescent band during the stationary irradiation of silica by electron beam.

Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition

2014 ◽  
Vol 23 (8) ◽  
pp. 088111 ◽  
Author(s):  
Jing-Yue Fang ◽  
Shi-Qiao Qin ◽  
Xue-Ao Zhang ◽  
Dong-Qing Liu ◽  
Sheng-Li Chang
Keyword(s):  
Electron Beam ◽  
Annealing Effect ◽  
Electron Beam Induced Deposition

scholarly journals Synthesis of Nanostructures using Electron Beam Induced Deposition

2008 ◽  
Vol 14 (S2) ◽  
pp. 242-243
Author(s):  
P Kruit ◽  
W van Dorp ◽  
K Hagen ◽  
PA Crozier
Keyword(s):  
Electron Beam ◽  
New Mexico ◽  
Electron Beam Induced Deposition ◽  
Synthesis Of Nanostructures

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

scholarly journals A novel copper precursor for electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 1220-1227 ◽  
Author(s):  
Caspar Haverkamp ◽  
George Sarau ◽  
Mikhail N Polyakov ◽  
Ivo Utke ◽  
Marcos V Puydinger dos Santos ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical Transmission ◽  
Pure Copper ◽  
Dielectric Behavior ◽  
Copper Oxidation ◽  
Transmission Electron ◽  
Sum Formula ◽  
Electron Beam Induced Deposition ◽  
High Degree ◽  
Good Agreement

A fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that pure copper nanocrystals with sizes of up to around 15 nm were dispersed inside the carbonaceous matrix. Raman investigations revealed a high degree of amorphization of the carbonaceous matrix and showed hints for partial copper oxidation taking place selectively on the surfaces of the deposits. Optical transmission/reflection measurements of deposited pads showed a dielectric behavior of the material in the optical spectral range. The general behavior of the permittivity could be described by applying the Maxwell–Garnett mixing model to amorphous carbon and copper. The dielectric function measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID.

scholarly journals Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

2015 ◽  
Vol 26 (47) ◽  
pp. 475701 ◽  
Author(s):  
F Porrati ◽  
M Pohlit ◽  
J Müller ◽  
S Barth ◽  
F Biegger ◽  
...  
Keyword(s):  
Electron Beam ◽  
Direct Writing ◽  
Alloy Nanostructures ◽  
Electron Beam Induced Deposition
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